Dicyclohexylperoxydicarbonat | 61114-49-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机碳酸及其衍生物
• 英文名称: Dicyclohexylperoxydicarbonat
• 英文别名: Dicyclohexyl dicarbonate；cyclohexyl cyclohexyloxycarbonyl carbonate
• CAS: 61114-49-6
• 化学式: C₁₄H₂₂O₅
• 分子量: 270.326
• InChiKey: FCCLVOALKRAYGP-UHFFFAOYSA-N

物化性质

• 沸点：
  371.5±9.0 °C(Predicted)
• 密度：
  1.14±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  19
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  Dicyclohexylperoxydicarbonat 、 聚甘氨酸 生成 N-cyclohexyloxycarbonyl-glycine
  参考文献：
  名称：

  POZDNEV, V. F.

  摘要：

  DOI：
• 作为产物：
  描述：

  sodium cyclohexanolate 生成 Dicyclohexylperoxydicarbonat
  参考文献：
  名称：

  POZDNEV, V. F.

  摘要：

  DOI：

文献信息

• Compositions, Halogenated Compositions, Chemical Production, and Telomerization Processes
  申请人：Brandstadter Stephan

  公开号：US20070276167A1

  公开（公告）日：2007-11-29

  Compositions are provided that can include R F (R T ) n Q, formula I (I), formula II (II), and/or R Cl (R T ) n H. The R F group can have four fluorine atoms, the R T group can include a C-2 group having a pendant —CF 3 group, n can be at least 1, the R 1 group can include a carbon atom, the R Cl group can be —CCI 3 , and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

  提供了可以包括RF(RT)nQ、化学式I (I)、化学式II (II)和/或RCl(RT)nH的组合物。RF基团可以有四个氟原子，RT基团可以包括一个带有—CF3基团的C-2基团，n至少可以为1，R1基团可以包括一个碳原子，RCl基团可以是—CCI3，Q基团可以包括周期表元素中的一个或多个原子。还提供了缩聚反应过程。
• Halogenated Compositions
  申请人：Brandstadter Stephan

  公开号：US20070027349A1

  公开（公告）日：2007-02-01

  Compositions are provided that can include R F (R T ) n Q, and/or R Cl (R T ) n H. The R F group can have four fluorine atoms, the R T group can include a C-2 group having a pendant —CF 3 group, n can be at least 1, the R 1 group can include a carbon atom, the R Cl , group can be —CCl 3 , and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

  提供的组合物可以包括RF（RT）nQ，和/或RCl（RT）nH。 RF基团可以有四个氟原子，RT基团可以包括一个具有一个悬挂的-CF3基团的C-2基团，n至少可以为1，R1基团可以包括一个碳原子，RCl基团可以是—CCl3，Q基团可以包括元素周期表中的一个或多个原子。还提供了缩聚反应过程。
• Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers
  申请人：Boggs Janet

  公开号：US20070149437A1

  公开（公告）日：2007-06-28

  Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. RF compositions such as R F -intermediates, R F -surfactants, R F -monomers, R F- monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F urethanes, and/or R F -foam stabilizers. The R F portion can include at least two —CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F -surfactants and/or R F -foam stabilizers are provided.

  提供生产过程和系统，包括反应卤代化合物，脱卤化合物，反应醇，反应烯烃和饱和化合物，将至少含有两个—CF3基团的反应物与具有环状基团的反应物反应。提供RF组分，例如RF中间体，RF表面活性剂，RF单体，RF单体单元，RF金属络合物，RF磷酸酯，RF乙二醇，RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个—CF3基团，至少三个—CF3基团，和/或至少两个—CF3基团和至少两个—CH2—基团。提供包括RF表面活性剂组分的清洁剂，乳化剂，油漆，粘合剂，油墨，润湿剂，发泡剂和消泡剂。提供包括RF单体单元的丙烯酸，树脂和聚合物。提供包括具有RF组分的基底的组合物。提供包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。
• Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers
  申请人：Boggs Janet

  公开号：US20070161537A1

  公开（公告）日：2007-07-12

  Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. R F -compositions such as R F -intermediates, R F -surfactants, R F monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and/or R F -foam stabilizers. The R F portion can include at least two CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F surfactants and/or R F -foam stabilizers are provided.

  提供了生产过程和系统，其中包括反应卤代化合物，去卤化化合物，反应醇，反应烯烃和饱和化合物，反应至少有两个—CF3基团的反应物与具有环状基团的反应物反应。提供了RF组分，例如RF中间体，RF表面活性剂，RF单体，RF单体单元，RF金属配合物，RF磷酸酯，RF乙二醇，RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个CF3基团，至少三个—CF3基团，以及至少两个—CF3基团和至少两个—CH2—基团。提供了包括RF表面活性剂组分的洗涤剂、乳化剂、油漆、粘合剂、油墨、润湿剂、起泡剂和消泡剂。提供了包括RF单体单元的丙烯酸、树脂和聚合物。提供了包括具有RF组分的基底的组合物。提供了可以包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。
• Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Foams, and Foam Stabilizers
  申请人：Boggs Janet

  公开号：US20070282115A1

  公开（公告）日：2007-12-06

  Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. R F -compositions such as R F -intermediates, R F -surfactants, R F -monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and/or R F -foam stabilizers. The R F portion can include at least two —CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F -surfactants and/or R F -foam stabilizers are provided.

  提供了包括反应卤代化合物、脱卤化合物、反应醇、反应烯烃和饱和化合物、反应至少具有两个-CF3基团的反应物与具有环状基团的反应物的生产过程和系统。提供了RF组分，例如RF中间体、RF表面活性剂、RF单体、RF单体单元、RF金属配合物、RF磷酸酯、RF乙二醇、RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个-CF3基团、至少三个-CF3基团，以及至少两个-CF3基团和至少两个-CH2-基团。提供了包括RF表面活性剂组分的洗涤剂、乳化剂、油漆、粘合剂、油墨、润湿剂、起泡剂和消泡剂。提供了包括RF单体单元的丙烯酸、树脂和聚合物。提供了包括RF组分覆盖在基底上的组合物。提供了可以包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。