Retention of configuration in double bond protection-deprotection by bromination-cathodic debromination
作者:Urda Husstedt、Hans J. Schäfer
DOI:10.1016/s0040-4039(01)92506-7
日期:1981.1
The double bond can be mildly protected by bromination with PyrHBr3; deprotection is achieved by cathodic reduction at −1.4 V. The overall yields range from 68 to 99 %, the configuration of the double bond is retained with at least 96 %.
双键可以通过用PyrHBr 3溴来适度保护; 通过在-1.4 V上进行阴极还原可实现脱保护。总产率为68%至99%,双键的构型至少保留96%。