trans-1,2-Bis-(3,4,5-trimethoxy-styryl)-benzol | 23820-37-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: trans-1,2-Bis-(3,4,5-trimethoxy-styryl)-benzol
• 英文别名: 1,2,3-trimethoxy-5-[(E)-2-[2-[(E)-2-(3,4,5-trimethoxyphenyl)ethenyl]phenyl]ethenyl]benzene
• CAS: 23820-37-3
• 化学式: C₂₈H₃₀O₆
• 分子量: 462.543
• InChiKey: CQVLFLBBAYFJEW-PHEQNACWSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.3
• 重原子数：
  34
• 可旋转键数：
  10
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.21
• 拓扑面积：
  55.4
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  邻二甲苯 、 N-苯基-1-(3,4,5-三甲氧基苯基)甲亚胺 在 potassium tert-butylate 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 生成 trans-1,2-Bis-(3,4,5-trimethoxy-styryl)-benzol
  参考文献：
  名称：

  Anil-Synthese。3. Mitteilung [1]与甲基苯乙烯取代的苯乙烯基衍生物-芳香环†

  摘要：

  甲基取代碳环芳烃，二苯基，三联苯，Stilben-，1,4-二苯基丁二烯-，Tolan-，1,4-二苯基丁二烯-，萘酚-，蒽环与苯并蒽-苯并二氮杂-苯并二氢萘Gegenwart von Kaliumhydroxid oder Kal-叔丁基中的二甲基甲酰胺。

  DOI：

  10.1002/hlca.19690520836

文献信息

• PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20130171415A1

  公开（公告）日：2013-07-04

  Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.

  揭示了一种光敏树脂组合物，包括：（组分A）由式（1）表示的肟磺酸盐化合物；（组分B）包括具有可被酸分解的基团的树脂，该基团通过酸分解形成羧基或酚羟基；和（组分C）溶剂 其中在式（1）中，R1表示烷基、芳基或杂芳基，每个R2独立地表示氢原子、烷基、芳基或卤素原子，Ar1表示邻芳撑基或邻杂芳撑基，X表示O或S，n表示1或2，前提是在化合物中存在两个或两个以上的R2时，至少有一个表示烷基、芳基或卤素原子。
• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140005409A1

  公开（公告）日：2014-01-02

  A compound represented by the following formula (I): wherein in formula (I), R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfo group, a cyano group, an aryl group or a heteroaryl group; R 2 represents an alkyl group or an aryl group; each of R 3 and R 4 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, a carbonyl group or an aryl group; X represents —O—, —S—, —NH—, —NR 5 —, —CH 2 —, —CR 6 H— or —CR 6 R 7 —; each of R 5 to R 7 independently represents an alkyl group or an aryl group; and R 1 and any one of R 5 to R 7 , or R 3 and R 4 , may be bonded to each other to form a ring.

  化合物的化学式为(I)：在化学式(I)中，R1代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、酰基、氨基羰基团、磺胺基团、磺基、氰基、芳基或杂环芳基；R2代表烷基基团或芳基；R3和R4中的每一个独立代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、羰基或芳基；X代表—O—、—S—、—NH—、—NR5—、—CH2—、—CR6H—或—CR6R7—；R5到R7中的每一个独立代表烷基基团或芳基；R1和R5到R7中的任意一个，或R3和R4，可以相互连接形成环。
• Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device
  申请人：Fujifilm Corporation

  公开号：EP2420890A1

  公开（公告）日：2012-02-22

  A positive photosensitive resin composition including: a resin comprising a structural unit having an acid dissociative group and a structural unit having a functional group capable of forming a covalent bond by reacting with a carboxyl group or a phenolic hydroxyl group; and an acid generator represented by the following formula (I): wherein in formula (I), R1 represents a hydrogen atom, an alkyl group, an alkenyl group, a cyano group, an aryl group or the like; R2 represents an alkyl group or an aryl group; each of R3 and R4 independently represents a hydrogen atom, an alkyl group an aryl group or the like; and X represents -O-, -S-, -NH- or the like.

  一种正性光敏树脂组合物，包括：一种树脂，其结构单元具有酸离解基团，其结构单元具有能与羧基或酚羟基反应形成共价键的官能团；以及一种由下式（I）代表的酸发生器： 式（I）中，R1 代表氢原子、烷基、烯基、氰基、芳基或类似基团；R2 代表烷基或芳基；R3 和 R4 各自独立地代表氢原子、烷基、芳基或类似基团；X 代表-O-、-S-、-NH-或类似基团。
• Photosensitive transfer material, pattern formation method, and etching method
  申请人：FUJIFILM Corporation

  公开号：US10108091B2

  公开（公告）日：2018-10-23

  A photosensitive transfer material including a support and a photosensitive resin composition layer, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B), and the photosensitive resin composition layer does not have an ethylenic crosslinking structure is a positive-type material, is excellent in terms of heat-resistant rectangular properties, etchant resistance, and resist peeling properties, and generates only a small amount of dust during processes; a pattern formation method, and an etching method.

  一种光敏转印材料，包括支撑体和光敏树脂组成层，其中光敏树脂组成层包括聚合物成分（A），聚合物成分包括具有组成单元（a1）的聚合物，组成单元（a1）包括酸基被酸可分解基团和光酸发生器（B）保护的基团，光敏树脂组成层不具有乙烯交联结构，是一种正型材料，在耐热矩形性能、耐蚀刻剂性能和抗剥离性能方面非常出色，并且在加工过程中仅产生少量粉尘；图案形成方法和蚀刻方法。
• Pattern forming method, etching method and method for producing capacitance-type input device
  申请人：FUJIFILM Corporation

  公开号：US10289001B2

  公开（公告）日：2019-05-14

  A pattern forming method includes forming a photosensitive resin composition layer on at least one surface of a substrate using a photosensitive transfer material, exposing the photosensitive resin composition layer; and developing the exposed photosensitive resin composition layer, in which the photosensitive transfer material includes a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, and the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

  一种图案形成方法包括使用光敏转印材料在基底的至少一个表面上形成光敏树脂组合物层，曝光光敏树脂组合物层；以及显影曝光的光敏树脂组合物层，其中光敏转印材料依次包括支撑体、热塑性树脂层和光敏树脂组合物层，光敏树脂组合物层包括聚合物成分（A），聚合物成分包括具有组成单元（a1）的聚合物，组成单元（a1）包括酸基被酸可分解基团保护的基团和光酸发生器（B）。