申请人:LI Mingqi
公开号:US20110250538A1
公开(公告)日:2011-10-13
New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
提供了合成光酸发生剂化合物(“PAGs”)的新方法,新的光酸发生剂化合物和包含此类PAG化合物的光刻胶组合物。在特定方面,提供了含砜基(S +)光酸发生剂和砜基光酸发生剂的合成方法。