A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.
一种聚合物组合物,包括(i)聚合物(a),其中含有一个单体单元,该单体单元含有一个功能基A,在存在酸的情况下加热后变得碱溶性,(ii)聚合物(b),其中含有一个单体单元,该单体单元含有一个功能基B,也在存在酸的情况下加热后变得碱溶性,但比功能基A不易变得碱溶性,如果需要,除(i)和(ii)之外或代替(ii),还包括分子量为300至15,000的
酚类化合物,与光酸发生剂一起形成一种适用于形成模式的抗蚀材料,具有极佳的灵敏度、分辨率、掩模线性和其他性能。