N-(4-硝基-1-萘基)-乙酰胺 | 24402-72-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: N-(4-硝基-1-萘基)-乙酰胺
• 英文名称: N-(4-nitronaphthalen-1-yl)acetamide
• 英文别名: N-(4-nitro-[1]naphthyl)-acetamide；N-(4-Nitro-[1]naphthyl)-acetamid；4-Nitro-1-acetamino-naphthalin；N-Acetyl-4-nitro-naphthylamin-[1]；N-(4-nitro-1-naphthalenyl)-acetamide；N-Acetyl-4-nitro-naphthylamin-(1)
• CAS: 24402-72-0
• 化学式: C₁₂H₁₀N₂O₃
• 分子量: 230.223
• InChiKey: SKACCCDFHQZGIA-UHFFFAOYSA-N

物化性质

• 熔点：
  127-128 °C(Solv: ethanol (64-17-5))
• 沸点：
  492.3±28.0 °C(Predicted)
• 密度：
  1.366±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  74.9
• 氢给体数：
  1
• 氢受体数：
  3

安全信息

• 海关编码：
  2924299090

反应信息

• 作为反应物：
  描述：

  N-(4-硝基-1-萘基)-乙酰胺 在 氢氧化钾 作用下， 生成 1-氨基-4-硝基萘
  参考文献：
  名称：

  Kleemann, Chemische Berichte, 1886, vol. 19, p. 336

  摘要：

  DOI：
• 作为产物：
  描述：

  硝基萘 在 盐酸羟胺 、 potassium hydroxide 作用下， 以 乙醇 为溶剂， 反应 1.0h， 生成 N-(4-硝基-1-萘基)-乙酰胺
  参考文献：
  名称：

  使用 K4[Fe(CN)6] 作为氰化物源直接氰化吡啶甲酰胺

  摘要：

  以无毒的K4[Fe(CN)6]为氰化物源，通过Pd催化的C-H键活化，开发了一种高效、简单、环保的吡啶甲酰胺直接氰化路线。

  DOI：

  10.1246/cl.150111

文献信息

• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• Base Multiplying Agents and Base-Reactive Curable Compositions
  申请人：Aoki Kenichi

  公开号：US20080200580A1

  公开（公告）日：2008-08-21

  To provide such a base multiplying agent capable of being used for crosslinking reaction, for example of a epoxy compound and the like, that generates another base by action of a base, and can efficiently perform base multiplying reaction, and a base-reactive curable composition using the base multiplying agent. The base generating agent of the invention is represented by the following formula (1): (In the formula (1), X represents a hydrogen atom, a substituted alkyl group or an unsubstituted alkyl group; Y represents a substituted or unsubstituted alkylene chain; and n represents an integer of from 1 to 4.)

  为了提供这样一种基数倍增剂，它能够用于交联反应，例如环氧化合物等，通过碱的作用产生另一种基数，并能够高效地进行基数倍增反应，以及使用该基数倍增剂的基反应固化组合物。该发明的基数生成剂由以下式（1）表示：（在式（1）中，X代表氢原子、取代烷基或未取代烷基；Y代表取代或未取代亚烷链；n代表1至4的整数。）
• ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20190002403A1

  公开（公告）日：2019-01-03

  The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

  本发明涉及一种由通式（A）表示的化合物，包括该化合物的生成碱基和/或基团产生剂等。在该式中，四个R1分别独立表示氢原子或氟原子；四个R2分别独立表示氟原子或三氟甲基基团；R3、R6、R7和R10分别独立表示氢原子或具有1至12个碳原子的烷基基团；R4和R5分别独立表示氢原子或具有1至12个碳原子的烷基基团，或者R4和R5相互连接表示具有2至4个碳原子的亚烷基基团；R8和R9分别独立表示氢原子、具有1至12个碳原子的烷基基团或具有6至14个碳原子且可选地具有选自包括具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至6个碳原子的烷硫基团、具有2至12个碳原子的二烷基氨基团、卤素原子和硝基基团的取代基的芳基团，或者R8和R9相互连接表示具有2至4个碳原子的亚烷基基团；前提是八个基团R3至R10中的两个或三个分别是氢原子，并且在其中两个基团分别是氢原子的情况下，其余基团中的三到六个分别是具有1至12个碳原子的烷基基团，而在其中三个基团分别是氢原子的情况下，其余基团中的四个或五个分别是具有1至12个碳原子的烷基基团。
• BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160122292A1

  公开（公告）日：2016-05-05

  It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)

  本发明的一个目的是提供一种基发生剂，其对通用有机溶剂具有高溶解度，可以直接溶解为一种碱反应性化合物，例如基于环氧树脂的化合物，进一步具有高耐热性和低亲核性的性能，并生成强碱，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。本发明涉及一种由通式（A）表示的化合物，包括该化合物的基发生剂，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。（其中R1至R5各自独立地表示氢原子；烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R6表示氢原子；可能具有取代基的烷基基团；烯基基团；炔基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R7表示氢原子；可能具有氨基的烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，Z-表示从具有特定结构的羧酸衍生的阴离子。）

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