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  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5
  • 重原子数:
    19
  • 可旋转键数:
    0
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.06
  • 拓扑面积:
    28.5
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • Benzo[a]phenothiazines and hydro-derivatives and pharmaceutical compositions containing them
    申请人:MERCK FROSST CANADA INC.
    公开号:EP0136893A2
    公开(公告)日:1985-04-10
    Pharmaceutical compositions contain a compound for the Formula or a pharmaceutically acceptable salt thereof. Certain compounds of Formula I are novel. Compounds of Formula I are useful in treating allergic conditions, asthma, cardrovascular disorders, inflammation and pain and are useful as cytoprotective agents. In Formula 1. X is O, S, SO or SO2; R, is H; C,-6 alkyl; C, -6 acyl; C1-6 aminoacyl; (C1-6 acyloxy)-(C1-6 alkyl); (C1-6 alkoxy)-(Cl-6 alkyl); benzoyl; substituted benzoyl in which the substitution in the phenyl ring (herein called "substituted as herein defined") is halogen, C1-3 alkyl, C1-3 alkoxy, CN, CF3, COOR6, OH, CH2COOR6 or (CH2)nNR8R9 where n is 0, 1 or 2; carbamoyl; CONHR7; COOR7; p-toluenesulfonyl; methane sulfonyl; or an acyl group such that R,-OH is an essential amino acid; each of R2, R3, R4 and R5, independently of the others, is hydrogen; C1-6 alkyl; C2-6 alkenyl; -(CHR6)pCOOR6, p being 0 or an integer from 1 to 4; or -(CH2)mM where m is 0 or an integer from 1 to 6 and M is (a) OR,s; (b) halogen; (c) CF3; (d) SR15; (e) phenyl or substituted phenyl as herein defined; (f) COOR6; (g) CO-R14; (h) tetrazolyl; (i) -NH-CO-R7; (j) -NR8R9; (k) -NHSO2R10 where R10 is OH, C1-6 alkyl, C1-6 alkoxy, or phenyl; (I) -COCH20H; (m) -SOR11 where R11 is C1-6 alkyl; phenyl; substituted phenyl as herein defined; (CH2)mCOOR6;CN; formyl or C1-4 perfluoroalkyl; (n) -CONR8R9; (o) -SO2NR8R9; (p) -SO2R13 where R13 is a hydrogen atom or a radical of the type defined for R11; (q) NO2; (r) O-CO-R14; (s) O-CO-NR8R9; (t) -CN; or (u) -OPO(OR6)2: each R6, independently of any other, is H, phenyl or C1-6 alkyl; each R7, independently of any other, is C1-6 alkyl, benzyl, phenyl or (C1-6 acyloxyl-(C1-6 alkyl); each R8 and each R9, independently of any other, is phenyl, substituted phenyl as herein defined, or C1-4 alkyl, or NR8R9 represents a heterocycloalkyl radical of 5 to 8 ring atoms; each R14, independently of any other, is H. (CH2)pCOOR6, C, 6 alkyl, C1-6 alkoxy, (C1-6 acyloxy)-(C1-6 alkoxy), phenyl, substituted phenyl as herein defined, or C, -6 aminoalkyl, or R14 is such that R14CO2H is an essential amino acid; R15 is H, (C1-6 alkoxy)-(C1-6 alkyl), (C, 6 acyloxyl-(C1-6 alkyl), C1-6 alkyl, benzyl, -(CH2)mCOOR6, CN, formyl, C1-4 perfluoroalkyl, CH2-R12 where R12 is C1-5 alkyldimethylamino or phenyl, phenyl, or substituted phenyl as herein defined; the broken lines in ring A represent optional double bonds; R2, R3, R4 and R5 may be positioned anywhere in the structure.
    药用组合物包含一种式化合物 或其药学上可接受的盐。式 I 的某些化合物是新型化合物。式 I 的化合物可用于治疗过敏性疾病、哮喘、心血管疾病、炎症和疼痛,并可用作细胞保护剂。 在式 1 中 X 是 O、S、SO 或 SO2; R,是 H;C,-6 烷基;C, -6酰基;C1-6氨基酰基;(C1-6酰氧基)-(C1-6烷基);(C1-6烷氧基)-(Cl-6烷基);苯甲酰基;取代的苯甲酰基,其中苯环中的取代基(此处称为 "如本文定义的取代基")是卤素、C1-3烷基、C1-3烷氧基、CN、CF3、COOR6、OH、CH2COOR6 或 (CH2)nNR8R9 其中 n 是 0、1 或 2;氨基甲酰基;CONHR7;COOR7;对甲苯磺酸基;甲烷磺酰基;或 R,-OH 为必需氨基酸的酰基; R2、R3、R4 和 R5 中各自独立地为氢;C1-6 烷基;C2-6 烯基;-(CHR6)pCOOR6,p 为 0 或 1 至 4 的整数;或-(CH2)mM,其中 m 为 0 或 1 至 6 的整数,M 为 (a) OR,s;(b) 卤素; (c) CF3; (d) SR15; (e) 本文定义的苯基或取代苯基; (f) COOR6; (g) CO-R14; (h) 四唑基; (i) -NH-CO-R7; (j) -NR8R9;(k) -NHSO2R10 其中 R10 为 OH、C1-6 烷基、C1-6 烷氧基或苯基; (I) -COCH20H; (m) -SOR11 其中 R11 为 C1-6 烷基;苯基;本文定义的取代苯基;(CH2)mCOOR6; CN; 甲酰基或 C1-4 全氟烷基;(n) -CONR8R9; (o) -SO2NR8R9 ; (p) -SO2R13 其中 R13 是氢原子或 R11 所定义的基团类型; (q) NO2; (r) O-CO-R14; (s) O-CO-NR8R9; (t) -CN;或 (u) -OPO(OR6)2: 每个 R6(独立于任何其他物质)是 H、苯基或 C1-6 烷基; 每个 R7(独立于任何其他物质)是 C1-6 烷基、苄基、苯基或 (C1-6 acyloxyl-(C1-6 烷基); 每个 R8 和每个 R9,各自独立地为苯基、本文定义的取代苯基或 C1-4 烷基,或 NR8R9 代表 5 至 8 个环原子的杂环烷基; (CH2)pCOOR6 是 H、(CH2)pCOOR6、C, 6 烷基、C1-6 烷氧基、(C1-6 乙酰氧基)-(C1-6 烷氧基)、苯基、本文定义的取代苯基或 C, -6 氨基烷基,或 R14 是这样的 R14CO2H 是必需氨基酸; R15 是 H、(C1-6 烷氧基)-(C1-6 烷基)、(C, 6 乙酰氧基-(C1-6 烷基))、C1-6 烷基、苄基、-(CH2)mCOOR6、CN、甲酰基、C1-4 全氟烷基、CH2-R12,其中 R12 是本文定义的 C1-5 烷基二甲基氨基或苯基、苯基或取代苯基; 环 A 中的断线代表可选的双键; R2、R3、R4 和 R5 可位于结构中的任何位置。
  • PHOTOELECTRIC CONVERSION DEVICE, PRODUCTION METHOD THEREOF, PHOTOSENSOR, IMAGING DEVICE AND THEIR DRIVE METHODS
    申请人:NOMURA Kimiatsu
    公开号:US20110063485A1
    公开(公告)日:2011-03-17
    A photoelectric conversion device comprising a transparent electrically conductive film, a photoelectric conversion film and an electrically conductive film in this order, wherein the photoelectric conversion film comprises a photoelectric conversion layer, and an electron blocking layer, wherein the electron blocking layer contains a compound represented by the specific formula.
  • METHOD FOR PURIFYING ORGANIC MATERIAL, MATERIAL FOR ORGANIC ELECTRONICS, PHOTOELECTRIC CONVERSION DEVICE, OPTICAL SENSOR, IMAGING DEVICE, AND ORGANIC ELECTROLUMINESCENCE DEVICE
    申请人:FUJIFILM CORPORATION
    公开号:US20140042411A1
    公开(公告)日:2014-02-13
    Provided is a method for purifying an organic material having a 10% weight reduction temperature of 250° C. or more as measured by thermogravimetry at a vacuum degree of 1×10 −2 Pa or less, which may sublime and purify the organic material having high heat resistance at high sublimation temperature with high purity and high yield in a short period of time, in which the organic material is subjected sublimation purification after a concentration of inorganic impurities in the organic material is adjusted to 5,000 ppm or less.
  • ORGANIC MATERIAL FOR DEPOSITION, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, DEPOSITION METHOD, AND MANUFACTURING METHOD FOR ORGANIC PHOTOELECTRONIC ONVERSION ELEMENT OBTAINED USING THE SAME
    申请人:FUJIFILM Corporation
    公开号:US20150129861A1
    公开(公告)日:2015-05-14
    An organic material for deposition that is used for dry deposition of an organic layer included in an organic photoelectric conversion element is provided in which the organic material contains an organic composition of the organic layer as a principal component, and a residual solvent content of the organic material for deposition is equal to or less than 3 mol %.
  • US8378339B2
    申请人:——
    公开号:US8378339B2
    公开(公告)日:2013-02-19
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