申请人:Merck Patent GmbH
公开号:US11059995B2
公开(公告)日:2021-07-13
[Problem] To provide a film forming composition curable at low temperature and a film forming method using the same. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and aspecific additive, and a film forming method comprising applying it on a substrate and curing. The specific additive is selected from the group consisting of (A) guanidines substituted by a hydrocarbylgroup, (B) crown ether amines containing oxygen and nitrogen as a member thereof, (C) cycloalkanes having an amino-substituted polycyclic structure, (D) oximes substituted by a hydrocarbyl group, and (E) imidazolines.
[问题] 提供一种可在低温下固化的成膜组合物及其成膜方法。[解决方法]一种由聚硅氧烷、有机溶剂和特定添加剂组成的成膜组合物,以及一种将其涂在基底上并固化的成膜方法。特异性添加剂选自以下组别:(A)被烃基取代的胍类;(B)含有氧和氮的冠醚胺;(C)具有氨基取代的多环结构的环烷烃;(D)被烃基取代的肟类和(E)咪唑类。