A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula
where R
1
represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R
2
represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF
3
) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R
3
represents hydrogen (H), methyl (CH
3
), trifluoromethyl (CF
3
), difluoromethyl (CHF
2
), fluoromethyl (CH
2
F), or a semi- or perfluorinated aliphatic chain; and where R
4
represents trifluoromethyl (CF
3
), difluoromethyl (CHF
2
), fluoromethyl (CH
2
F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
提供了一种光阻组合物,其中包括聚合物,该聚合物具有至少一种
丙烯酸酯或
甲基丙烯酸酯单体,其具有以下结构式:其中R1代表氢(H)、具有1到20个碳的线性或支链烷基,或具有1到20个碳的半
氟或
全氟化的线性或支链烷基;其中R2代表未取代的脂肪族基或取代的脂肪族基,该脂肪族基每个碳上附有零或一个三
氟甲基(
CF3)基团,或取代或未取代的芳香族基;其中R3代表氢(H)、甲基(
CH3)、三
氟甲基( )、二
氟甲基(
CHF2)、
氟甲基(
CH2F)或半
氟或
全氟化的脂肪族链;其中R4代表三
氟甲基( )、二
氟甲基( )、
氟甲基( )或半
氟或
全氟化的取代或未取代的脂肪族基。本文还提供了使用该光阻组合物进行图案化基板的方法。