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4-heptenyl chloride | 70732-49-9

中文名称
——
中文别名
——
英文名称
4-heptenyl chloride
英文别名
(Z)-1-chlorohept-4-ene;cis-4-heptenyl chloride;7-Chlor-cis-3-hepten;7-chloro-hept-3c-ene;(Z)-7-chlorohept-3-ene
4-heptenyl chloride化学式
CAS
70732-49-9
化学式
C7H13Cl
mdl
——
分子量
132.633
InChiKey
SLNKHNQXBZBFQD-ARJAWSKDSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.9
  • 重原子数:
    8
  • 可旋转键数:
    4
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.71
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    0

反应信息

  • 作为反应物:
    描述:
    4-heptenyl chloride 以95%的产率得到
    参考文献:
    名称:
    DEJARLAIS W. J.; EMKEN E. A., J. LABELLED COMPOUNDS AND RADIOPHARM., 1978, 15, 451-460
    摘要:
    DOI:
  • 作为产物:
    描述:
    7-氯-3-庚炔 在 Lindlar's catalyst 氢气 作用下, 生成 4-heptenyl chloride
    参考文献:
    名称:
    二、四和六氘化 11-十八碳烯酸酯的合成
    摘要:
    11-十八碳烯酸-15、16-d2、-15、15、16、16-d4 和-10、10、15、15、16、16-d6 酸的甲酯通过 Wittig 合成从衍生自 11 的中间体制备-溴十一烷酸和 7-氯-3-庚炔。二氘酸通过庚炔的部分氢化,然后用氘饱和为 1-氯庚烷-4, 5-d2 来制备,用于 Wittig 合成。庚炔与氘的饱和提供了四氘酸的 Wittig 中间体。六氘酸由四氘代烷基卤化物和 10-甲酰基癸酸酯-10, 10-d2 制备。
    DOI:
    10.1002/jlcr.2580150151
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文献信息

  • A novel photoinduced reduction system of low-valent samarium species: reduction of organic halides and chalcogenides, and its application to carbonylation with carbon monoxide
    作者:Yukihito Sumino、Nami Harato、Yuri Tomisaka、Akiya Ogawa
    DOI:10.1016/j.tet.2003.08.070
    日期:2003.12
    irradiation is found to enhance the reducing ability of samarium diiodide (SmI2) dramatically. Organic halides (RCl, RBr, RI) and chalcogenides (RSPh, RSePh, RTePh) are smoothly reduced to the corresponding hydrocarbons by using this SmI2–hv system. The photoactivation can be also applied to ytterbium diiodide (YbI2) successfully. When the reduction of alkyl chlorides (RCl) by using the SmI2–hv system is conducted
    发现可见光照射可显着增强二化sa(SmI 2)的还原能力。通过使用此SmI 2 - hv系统,有机卤化物(RCl,RBr,RI)和族化物(RSPh,RSePh,RTePh)可以平滑地还原为相应的烃。光活化也可以成功地应用于二化((YbI 2)。当在一氧化碳的压力下使用SmI 2 - hv系统还原烷基化物(RCl)时,会获得不对称的酮(RC(O)CH 2 R)作为羰基化产物。机械途径可能涉及酰基sa物种(RC(O)SmI 2),然后进行二聚化,然后用SmI 2还原,得到不对称的酮。
  • Photoinduced Reduction and Carbonylation of Organic Chlorides with Samarium Diiodide
    作者:Akiya Ogawa、Yukihito Sumino、Taizoh Nanke、Syoji Ohya、Noboru Sonoda、Toshikazu Hirao
    DOI:10.1021/ja963117p
    日期:1997.3.1
  • Enantioselective total syntheses of indolizidine alkaloids (-)-205A and (-)-235B
    作者:Richard P. Polniaszek、Stephen E. Belmont
    DOI:10.1021/jo00016a013
    日期:1991.8
    Enantioselective total syntheses of indolizidine alkaloids (-)-205A and (-)-235B are described. The syntheses proceed via a common late-stage intermediate, alpha-aminonitrile 1. Absolute stereochemical control over the C8 and C8a stereocenters in these materials was achieved by a stereoselective crotylation reaction between chiral acyliminium ion (R)-3b and crotylmagnesium chloride. The selectivity of this reaction, which produced the (future)-8R,8aS configuration was complementary to the result obtained by crotylation of acyliminium ion (S)-3a with trans-crotyltrimethylsilane, which produced predominantly an adduct with the (future)-8S,8aS configuration. This latter crotyl lactam was converted to two additional diastereomers of alkaloid 205A. Comparison of the H-1 and C-13 NMR and optical rotation values of the four synthetic diastereomers of 205A with literature values supported the proposed assignment of the absolute and relative configuration of (-)-205A. The C-13 spectrum of synthetic (5R,8R,8aS)-235B was identical with that of natural 235B and supported the proposed assignment of relative configuration of the alkaloid. The optical rotation differed in sign and magnitude from the published value. Revised values of the optical rotations of (-)-205A and (-)-235B are suggested. This work constitutes the first enantioselective syntheses of 205A and 235B, which were prepared in 15 and 14 steps, respectively, from succinic anhydride, in an average overall yield of 17%.
  • US7655253B2
    申请人:——
    公开号:US7655253B2
    公开(公告)日:2010-02-02
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