2-Hydroxy-5,6-dimethyl-hydrochinon | 4382-97-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 2-Hydroxy-5,6-dimethyl-hydrochinon
• 英文别名: Benzol-5,6-dimethyl-1,2,4-triol；3,4,6-Trihydroxy-1,2-dimethyl-benzol；5,6-Dimethyl-1,2,4-benzenetriol；5,6-dimethylbenzene-1,2,4-triol
• CAS: 4382-97-2
• 化学式: C₈H₁₀O₃
• 分子量: 154.166
• InChiKey: KZHQLGKPCCUEJY-UHFFFAOYSA-N

物化性质

• 沸点：
  321.2±37.0 °C(Predicted)
• 密度：
  1.314±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,2,4-Triacetoxy-3,5-dimethyl-benzol 生成 2-Hydroxy-5,6-dimethyl-hydrochinon
  参考文献：
  名称：

  869.酚的生物合成。第九部分 Asperugin，曲霉菌的代谢产物

  摘要：

  DOI：

  10.1039/jr9650004672

文献信息

• Process for preparing para-hydroxybenzyl alcohol
  申请人：MITSUBISHI PETROCHEMICAL CO., LTD.

  公开号：EP0386639A1

  公开（公告）日：1990-09-12

  A process for preparing p-hydroxybenzyl alcohol or a derivative thereof comprising reacting a phenol and a formaldehyde source under a basic condition is disclosed, wherein the reaction is carried out in an alcoholic organic solvent in the presence of a crown ether. The process achieves high selectivity toward the para position without involving high cost.

  本发明公开了一种制备对羟基苯甲醇或其衍生物的工艺，该工艺包括在碱性条件下使苯酚和甲醛源发生反应，其中反应是在有冠醚存在的醇类有机溶剂中进行的。该工艺对对位具有高选择性，且成本不高。
• PROCESS FOR PARA-METHYLOLATING PHENOLIC COMPOUND
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP0485613A1

  公开（公告）日：1992-05-20

  A highly selective process for para-methylolating a phenolic compound, which comprises conducting the reaction of the phenolic compound with a formaldehyde source in an alcoholic organic solvent in the presence of a quaternary ammonium as the counter cation of a phenol anion.

  一种对甲醇化酚类化合物的高选择性工艺，包括在醇类有机溶剂中，在季铵作为酚阴离子的反阳离子存在下，使酚类化合物与甲醛源发生反应。
• High-molecular-weight novolak substituted phenolic resins and their preparation
  申请人：MITSUI PETROCHEMICAL INDUSTRIES, LTD.

  公开号：EP0032062B1

  公开（公告）日：1985-04-03
• Color diffusion transfer photographic light-sensitive material
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0385408B1

  公开（公告）日：1997-02-05
• Positive photoresist and method for producing structure
  申请人：Nakamura Masanori

  公开号：US20070172755A1

  公开（公告）日：2007-07-26

  Disclosed herein are a positive-type photoresist which can be developed with an aqueous alkali solution of low concentration or neutral water, can be readily stripped with ozone water, hardly produces scum, and contributes to reduction in costs and environmental loads, and a method for manufacturing a structure having a circuit formed using a resist pattern of the photoresist. A positive-type photoresist comprising a novolac resin having a benzene nucleus to which two or more hydroxyl groups are bonded and a weight-average molecular weight of 1,000 to 20,000. A method for manufacturing a structure having a circuit formed using as a resist pattern the positive-type photoresist comprising the steps of forming a resist film on the surface of a substrate by the use of the positive-type photoresist, exposing the resist film to light and carrying out development, forming a circuit using the resist pattern, and removing the resist film.