Cyclic acetal compound, polymer, resist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20030045731A1
公开(公告)日:2003-03-06
Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
1