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2,2',4,4'-tetrahydroxybibenzyl

中文名称
——
中文别名
——
英文名称
2,2',4,4'-tetrahydroxybibenzyl
英文别名
4,4'-(ethane-1,2-diyl)dibenzene-1,3-diol;4-[2-(2,4-Dihydroxyphenyl)ethyl]benzene-1,3-diol
2,2',4,4'-tetrahydroxybibenzyl化学式
CAS
——
化学式
C14H14O4
mdl
——
分子量
246.263
InChiKey
WKIFTWPZTZUMRN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.7
  • 重原子数:
    18
  • 可旋转键数:
    3
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    80.9
  • 氢给体数:
    4
  • 氢受体数:
    4

反应信息

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文献信息

  • [EN] SULFONIUM SULFATES, THEIR PREPARATION AND USE<br/>[FR] SULFATES DE SULFONIUM, LEUR PRÉPARATION ET UTILISATION
    申请人:BASF SE
    公开号:WO2012113829A1
    公开(公告)日:2012-08-30
    The present invention relates to a heat-curable composition comprising (a) at least one compound which is capable of undergoing cationic polymerization; and (b) at least one sulfonium sulfate selected from compounds of the formulae Ia and Ib where Yn- is a monovalent or divalent anion selected from (1) where n, M, R1 to R10 are as defined in claim 1 and in the description. The present invention also relates to novel sulfonium sulfates of the formulae Ia and Ib, to a process for curing cationically polymerizable material and to the cured material obtained by said process.
    本发明涉及一种热固化组合物,包括(a)至少一种能够进行阳离子聚合的化合物;和(b)选择自式Ia和Ib的至少一种砜酸盐,其中Yn-是从(1)中选择的一价或二价阴离子,其中n、M、R1至R10如权利要求1和描述中所定义。本发明还涉及式Ia和Ib的新型砜酸盐,以及用于固化阳离子聚合材料的工艺和通过该工艺获得的固化材料。
  • [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
    申请人:BASF SE
    公开号:WO2016124493A1
    公开(公告)日:2016-08-11
    Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
    化合物的化学式(I)和(IA),其中X为-O(CO)-;R1为C1-C12卤代烷基或C6-C10卤代芳基;R2位于香豆素环的第7位,为OR8;R2a、R2b和R2C彼此独立地为氢;R3为C1-C8卤代烷基或C1-C8卤代烷基;R4为氢;R8为C1-C6烷基,适用于作为感光酸给体,用于制备光刻胶组合物,例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器(LCD)的制备。
  • SERIES OF SKIN WHITENING (LIGHTENING) COMPOUNDS
    申请人:Nandy Sandip K.
    公开号:US20100016347A1
    公开(公告)日:2010-01-21
    The present invention is directed to inhibitors of tyrosinase, pharmaceutical compositions comprising such tyrosinase inhibitors, and methods of making and using the same. Specifically, included in the present invention are compositions of matter comprised of at least one 2,4-dihydroxybenzene analog, which inhibit the activity of tyrosinase and which inhibit the overproduction of melanin.
    本发明涉及酪氨酸酶抑制剂,包含此类酪氨酸酶抑制剂的药物组合物,以及制备和使用这些药物的方法。具体而言,本发明包括至少一种2,4-二羟基苯类似物组成的物质组合物,这些组合物抑制酪氨酸酶的活性并抑制黑色素的过度产生。
  • [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
    申请人:BASF SE
    公开号:WO2010046240A1
    公开(公告)日:2010-04-29
    Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).
    化合物的公式(I),其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基,萘基,联苯基或杂环基,均可选取代; 或者例如Ar1和Ar2与直接键,O,S或(CO)一起形成融合的环系统; R例如是氢,C3-C30环烷基或C1-C18烷基; R1,R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂(PAG)。
  • [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
    申请人:CIBA HOLDING INC
    公开号:WO2009047151A1
    公开(公告)日:2009-04-16
    Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.
    化合物的式子(I),其中X是单键,CRaRb O,S,NRC,NCORC,CO,SO或SO2; L,L1,L2,L3,L4,L5,L6,L7和L8例如是氢,R1或COT; T表示T1或O-T2; T1和T2例如是氢,C1-C20烷基,C3-C12环烷基,C2-C20烯基,C5-C12环烯基,C6-C14芳基,C3-C12杂芳基,被一个或多个D取代的C1-C20烷基,被一个或多个E中断的C2-C20烷基,被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1,R2,R3,R4,Ra,Rb和Rc是T1; D例如是R5,OR5,SR5或Q1; E例如是O,S,COO或Q2; R5和R6例如是氢,C1-C12烷基或苯基; Q例如是C6-C12双环烷基,C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L,L1,L2,L3,L4,L5,L6,L7和L8中至少有一个不是氢; 并且前提是(i)至少有一个T1或T2是Q组; 或(ii)至少有一个D是Q1组; 或(iii)至少有一个E是Q2组; 适用于光潜催化剂。
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