di-1-naphtyliodonium | 137337-65-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: di-1-naphtyliodonium
• 英文别名: Dinaphthalen-1-yliodanium
• CAS: 137337-65-6
• 化学式: C₂₀H₁₄I
• 分子量: 381.236
• InChiKey: UBBLLAWOTYUCQO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  21
• 可旋转键数：
  2
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  ethyl 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionate 、 di-1-naphtyliodonium 在 sodium hydride 作用下， 生成 3,3,3-Trifluoro-2-(naphthalen-1-yloxy)-2-trifluoromethyl-propionic acid ethyl ester
  参考文献：
  名称：

  Haydock; Mulholland; Telford, European Journal of Medicinal Chemistry, 1984, vol. 19, # 3, p. 205 - 214

  摘要：

  DOI：

文献信息

• PHOTOACID GENERATORS
  申请人：Thackeray James W.

  公开号：US20120141939A1

  公开（公告）日：2012-06-07

  A photoacid generator compound has formula (I): G + Z − (I) wherein G has formula (II): In formula (II), X is S or I, each R 0 is commonly attached to X and is independently C 1-30 alkyl; polycyclic or monocyclic C 3-30 cycloalkyl; polycyclic or monocyclic C 6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R 0 groups are further attached to an adjacent R 0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

  一种光酸发生剂化合物具有以下式(I)：G+Z−(I)，其中G具有以下式(II)： 在式(II)中，X为S或I，每个R0通常连接到X，并且独立地为C1-30烷基；多环或单环的C3-30环烷基；多环或单环的C6-30芳基；或包含至少其中一种上述基团的组合。G的分子量大于263.4克/摩尔，或小于263.4克/摩尔。一个或多个R0基团进一步连接到相邻的R0基团，a为2或3，其中当X为I时，a为2，或当X为S时，a为2或3。式(I)中的Z包括磺酸盐、磺酰亚胺或磺酰胺的阴离子。光阻剂和涂层膜还包括该光酸发生剂，并且形成电子器件的方法使用该光阻剂。
• METHOD OF PREPARING PHOTOACID GENERATING MONOMER
  申请人：Coley Suzanne M.

  公开号：US20120172619A1

  公开（公告）日：2012-07-05

  A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C 1-10 alkyl, fluoro-substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluoro-substituted C 1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.

  一种制备单体的方法包括将公式（I）的磺酮与具有聚合基团的亲核试剂反应，其中每个R独立地为F、C1-10烷基、氟取代的C1-10烷基、C1-10环烷基或氟取代的C1-10环烷基，但至少一个R为F；n为0至10的整数，m为1至4+2n的整数。通过这种方法可以制备单体，包括光酸生成单体。
• PHOTOACID GENERATING MONOMER AND PRECURSOR THEREOF
  申请人：Coley Suzanne M.

  公开号：US20120172555A1

  公开（公告）日：2012-07-05

  A monomer compound has the formula (I): where each R 1 , R 2 , and R 3 is independently H, F, C 1-10 alkyl, fluoro-substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluoro-substituted C 1-10 cycloalkyl, provided that at least one of R 1 , R 2 , or R 3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C 2-30 olefin-containing polymerizable group, and G + is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C 2-30 olefin-containing compound. A polymer includes the monomer of formula (I).

  一种单体化合物具有以下化学式（I）：其中每个R1、R2和R3独立地是H、F、C1-10烷基、氟代C1-10烷基、C1-10环烷基或氟代C1-10环烷基，前提是R1、R2或R3中至少有一个是F；n是1到10之间的整数，A是卤代或非卤代的C2-30烯烃含有聚合基团，G+是有机或无机阳离子。该单体是砜前体和含有羟基的卤代或非卤代C2-30烯烃含有化合物的氧负离子的反应产物。聚合物包括化学式（I）的单体。
• [EN] DENTAL COMPOSITION COMPRISING A PARTICULATE CARRIER SUPPORTING A COINITIATOR<br/>[FR] COMPOSITION DENTAIRE COMPRENANT UN SUPPORT PARTICULAIRE CONTENANT UN CO-INITIATEUR
  申请人：DENTSPLY DETREY GMBH

  公开号：WO2019043056A1

  公开（公告）日：2019-03-07

  The present invention relates to a dental composition comprising a photoinitiator system comprising a particulate carrier supporting a coinitiator covalently bonded to the surface of the carrier. Furthermore, the present invention relates to a use of the particulate carrier in a dental composition. The particulate carrier displays multiple covalently bonded tertiary amino groups and/or tertiary phosphine groups on the surface, for crosslinking monomers, oligomers and/or polymers having one or more polymerizable double bonds.

  本发明涉及一种牙科组合物，其包括一种光引发剂系统，该系统包括一种颗粒载体，支持着与载体表面共价结合的辅助引发剂。此外，本发明涉及将该颗粒载体用于牙科组合物的用途。该颗粒载体在表面显示多个共价结合的三级胺基团和/或三级膦基团，用于交联具有一个或多个可聚合双键的单体、寡聚物和/或聚合物。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。