2-(prop-1-en-2-yl)-9H-xanthen-9-one | 1134090-51-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: 2-(prop-1-en-2-yl)-9H-xanthen-9-one
• 英文别名: 2-Prop-1-en-2-ylxanthen-9-one
• CAS: 1134090-51-9
• 化学式: C₁₆H₁₂O₂
• 分子量: 236.27
• InChiKey: STCNJWLULFFTMA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.06
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  3-acetoxy-2-methyl-2-(9-oxo-9H-xanthene-2-yl)propionic acid 反应 0.25h， 生成 2-(prop-1-en-2-yl)-9H-xanthen-9-one
  参考文献：
  名称：

  Blake, Jessie A.; Lukeman, Matthew; Scaiano, Juan C., Journal of the American Chemical Society, 2009, vol. 131, p. 4127 - 4135

  摘要：

  DOI：

文献信息

• Development of photo-controllable hydrogen sulfide donor applicable in live cells
  作者：Naoki Fukushima、Naoya Ieda、Mitsuyasu Kawaguchi、Kiyoshi Sasakura、Tetsuo Nagano、Kenjiro Hanaoka、Naoki Miyata、Hidehiko Nakagawa

  DOI：10.1016/j.bmcl.2014.11.084

  日期：2015.1

  Hydrogen sulfide (H2S) has multiple physiological roles, for example, in vasodilation and inflammation. It is a highly reactive gas under ambient conditions, so controllable H2S donors are required for studying its biological functions. Here, we describe the design, synthesis and application of a H2S donor (SPD-2) that utilizes xanthone photochemistry to control H2S release. H2S generation from SPD-2 was completely dependent on UVA-irradiation (325-385 nm), as confirmed by methylene blue assay and by the use of a H2S-selective fluorescent probe. SPD-2 was confirmed to provide controlled H2S delivery in live cells, and should be suitable for various biological applications. (C) 2014 The Authors. Published by Elsevier Ltd.
• OVERLAY FILM FORMING COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME
  申请人：AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.

  公开号：US20150140490A1

  公开（公告）日：2015-05-21

  An object of the present invention is to provide a composition enabling to form a topcoat layer capable of preventing outgassing and of keeping deep UV light from impairing pattern shape in a lithographic process with extreme UV light. The object can be achieved by a composition of the invention for forming a topcoat layer. The composition contains a water-soluble polymer comprising hydrophilic groups and deep-UV absorbing groups absorbing light of 170 to 300 nm, and an aqueous solvent. The solvent comprises 70 weight % or more of water. The composition is cast on a resist layer and heated to harden, and thereafter the resist layer is subjected to exposure by use of extreme UV light and then developed to form a pattern.