1,5-bis-(1-hydroxy-ethyl)-naphthalene | 33929-65-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1,5-bis-(1-hydroxy-ethyl)-naphthalene
• 英文别名: 1,5-Bis-(1-hydroxy-aethyl)-naphthalin；1-[5-(1-Hydroxyethyl)naphthalen-1-yl]ethanol
• CAS: 33929-65-6
• 化学式: C₁₄H₁₆O₂
• 分子量: 216.28
• InChiKey: GWXHWIDHAATXBD-UHFFFAOYSA-N

物化性质

• 沸点：
  397.7±22.0 °C(Predicted)
• 密度：
  1.164±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1,5-bis-(1-hydroxy-ethyl)-naphthalene 在 吡啶 、 fired clay 作用下， 400.0 ℃ 、5.33 kPa 条件下， 生成 1,5-Divinylnaphthalene
  参考文献：
  名称：

  Stephan, Chemische Berichte, 1957, vol. 90, p. 296

  摘要：

  DOI：
• 作为产物：
  描述：

  1-(5-乙酰基萘-1-基)乙酮 在 sodium tetrahydroborate 作用下， 生成 1,5-bis-(1-hydroxy-ethyl)-naphthalene
  参考文献：
  名称：

  Canonne,P.; St-Jean,R., Bulletin de la Societe Chimique de France, 1971, p. 3052 - 3057

  摘要：

  DOI：

文献信息

• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10545405B2

  公开（公告）日：2020-01-28

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

  本发明提供了一种感光性或辐射敏感性树脂组合物，包括在酸的作用下在碱显影剂中的溶解度降低的化合物 (A)、具有在碱显影剂中分解以增加在碱显影剂中的溶解度的基团且至少具有一个氟原子或硅原子的树脂 (B) 以及具有与树脂 (B) 不同的酚羟基的树脂 (C)、使用感光性或辐射敏感性胶片和掩膜坯形成的感光性或辐射敏感性胶片和掩膜坯、和一种具有不同于树脂（B）的酚羟基的树脂（C），一种感光胶片或感光胶片和一种掩膜坯，它们分别使用感光胶片或感光胶片树脂组合物形成，一种使用感光胶片或感光胶片树脂组合物的图案形成方法，以及一种制造电子设备的方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170351176A1

  公开（公告）日：2017-12-07

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
• PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD
  申请人：FUJIFILM Corporation

  公开号：US20180087010A1

  公开（公告）日：2018-03-29

  Provided is a pre-rinsing liquid used in a method including forming a resist film including an actinic ray-sensitive or radiation-sensitive composition on a substrate, and irradiating the resist film with actinic rays or radiation to form a pattern on the substrate, and used for subjecting the substrate to a pre-rinsing treatment before applying the actinic ray-sensitive or radiation-sensitive composition onto the substrate. The pre-rinsing liquid satisfies the following conditions (1) and (2): (1) the pre-rinsing liquid includes 80% by mass or more of an organic solvent with respect to the total mass of the pre-rinsing liquid, and (2) the organic solvent is at least one organic solvent selected from the group consisting of alcohols, cyclic ethers, glycol ethers, glycol ether acetates, hydrocarbons, ketones, lactones, and esters.