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1-hydroxy-[2]naphthoic acid-[1]naphthylamide | 23681-51-8

中文名称
——
中文别名
——
英文名称
1-hydroxy-[2]naphthoic acid-[1]naphthylamide
英文别名
1-Hydroxy-[2]naphthoesaeure-[1]naphthylamid;1-hydroxy-N-naphthalen-1-ylnaphthalene-2-carboxamide
1-hydroxy-[2]naphthoic acid-[1]naphthylamide化学式
CAS
23681-51-8
化学式
C21H15NO2
mdl
——
分子量
313.356
InChiKey
XONOMXGMXXPOSQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    479.3±28.0 °C(Predicted)
  • 密度:
    1.333±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5.5
  • 重原子数:
    24
  • 可旋转键数:
    2
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    49.3
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

点击查看最新优质反应信息

文献信息

  • Composition, method for producing patterned substrate, film and forming method thereof, and compound
    申请人:JSR CORPORATION
    公开号:US10146131B2
    公开(公告)日:2018-12-04
    A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
    一种组合物包括由式(1)表示的部分结构的化合物和溶剂。在式(1)中,X1 和 X2 各自独立地代表具有 4 至 10 个环原子的取代或未取代环结构,它们与邻近 X1 或 X2 的螺碳原子和芳香环的碳原子一起构成;n1 和 n2 各自独立地为 0 至 2 的整数;k1 和 k2 之和各自独立地为 1 至 8 的整数,其中 k1 和 k2 之和不小于 2 也不大于 16。化合物最好用式(2)表示。式(1)中 k1 和 k2 之和最好不小于 3。
  • Kirsanow et al., Ukrainskij Khimicheskij Zhurnal, 1956, vol. 22, p. 498,500,502
    作者:Kirsanow et al.
    DOI:——
    日期:——
  • COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FORMING METHOD THEREOF, AND COMPOUND
    申请人:JSR CORPORATION
    公开号:US20160011512A1
    公开(公告)日:2016-01-14
    A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X 1 and X 2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X 1 or X 2 ; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
  • Portnaja et al., Zhurnal Obshchei Khimii, 1956, vol. 26, p. 2537,2543,2544
    作者:Portnaja et al.
    DOI:——
    日期:——
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