Composition, method for producing patterned substrate, film and forming method thereof, and compound
申请人:JSR CORPORATION
公开号:US10146131B2
公开(公告)日:2018-12-04
A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
一种组合物包括由式(1)表示的部分结构的化合物和溶剂。在式(1)中,X1 和 X2 各自独立地代表具有 4 至 10 个环原子的取代或未取代环结构,它们与邻近 X1 或 X2 的螺碳原子和芳香环的碳原子一起构成;n1 和 n2 各自独立地为 0 至 2 的整数;k1 和 k2 之和各自独立地为 1 至 8 的整数,其中 k1 和 k2 之和不小于 2 也不大于 16。化合物最好用式(2)表示。式(1)中 k1 和 k2 之和最好不小于 3。