1H,4H/2H-nonafluorocyclohexane | 356-34-3

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 1H,4H/2H-nonafluorocyclohexane
• 英文别名: 1.2.3.3.4.5.5.6.6-Nonafluor-cyclohexan；1H,2H,4H/-Octafluorcyclohexan；1H,2H/4H-Nonafluor-cyclohexan；1H,4H/2H-Nonafluor-cyclohexan；1H/2H,4H-Nonafluor-cyclohexan；1H,2H,4H-Nonafluorcyclohexan；1,1,2,2,3,4,4,5,6-Nonafluorocyclohexane
• CAS: 356-34-3
• 化学式: C₆H₃F₉
• 分子量: 246.075
• InChiKey: DVAJXVTXOULZLP-UHFFFAOYSA-N

物化性质

• 沸点：
  95.4±40.0 °C(Predicted)
• 密度：
  1.54±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  1H,4H/2H-nonafluorocyclohexane 在 silicone antifoam agent 、 potassium carbonate 作用下， 以 水 为溶剂， 反应 3.0h， 以37%的产率得到3H/4H-octafluorocyclohexene
  参考文献：
  名称：

  Fluorocyclohexanes part XV [1] dehydrofluorinations of undeca- deca- and nona- fluorocyclohexanes

  摘要：

  DOI：

  10.1016/s0022-1139(00)82205-8
• 作为产物：
  描述：

  trans-2.3.4.5.5.6.6-Heptafluor-cyclohexen-(1) 在 cobalt (III) fluoride 作用下， 生成 1H,4H/2H-nonafluorocyclohexane
  参考文献：
  名称：

  与复杂的金属氟化物氟化。第一部分：用氟化钴钴络合物氟化苯，氟苯和对二氟苯

  摘要：

  苯，氟苯和对二氟苯已与氟化钴钴配合物在气相中氟化，得到了许多已知的和新的已被充分表征的氟代环己烯。

  DOI：

  10.1039/j39690001060

文献信息

• Replacement solvents having improved properties and methods of using the same
  申请人：Grzyll R. Lawrence

  公开号：US20060166851A1

  公开（公告）日：2006-07-27

  CFC replacement solvent compositions, methods of using the same and methods of making the same. These compositions meet or exceed the solvency, flammability, and compatibility requirements for CFC's while providing similar or improved environmental and toxicological properties. These solvent compositions have application including, but not limited to, oxygen handling, refrigeration or heat pumps, electronics, implantable prosthetic devices, and optical equipment.

  CFC替代溶剂组合物，其使用方法和制备方法。这些组合物满足或超过了CFC的溶解度、易燃性和兼容性要求，同时提供类似或更好的环境和毒理学特性。这些溶剂组合物的应用包括但不限于氧气处理、制冷或热泵、电子、植入假体设备和光学设备。
• Replacement Solvents Having Improved Properties and Methods of Using the Same
  申请人：GRZYLL Lawrence R.

  公开号：US20090026418A1

  公开（公告）日：2009-01-29

  CFC replacement solvent compositions, methods of using the same and methods of making the same. These compositions meet or exceed the solvency, flammability, and compatibility requirements for CFC's while providing similar or improved environmental and toxicological properties. These solvent compositions have applications including, but not limited to, oxygen handling, refrigeration or heat pumps, electronics, implantable prosthetic devices, and optical equipment.

  CFC替代溶剂组合物，使用方法和制备方法。这些组合物在满足或超过CFC的溶解性、易燃性和兼容性要求的同时，提供类似或更好的环境和毒理学性质。这些溶剂组合物的应用包括但不限于氧气处理、制冷或热泵、电子、植入式假体和光学设备。
• SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
  申请人：SCREEN Holdings Co., Ltd.

  公开号：EP3249682A1

  公开（公告）日：2017-11-29

  Disclosed is a substrate treating apparatus including the following units: a supplying unit which supplies a process liquid including a sublimable substance in a melt state on a pattern-formed surface of a substrate W; a solidifying unit which solidifies the process liquid on the pattern-formed surface to produce a solidified body; and a sublimating unit which sublimates the solidified body to remove the solidified body from the pattern-formed surface. In this apparatus, the sublimable substance includes a fluorinated carbon compound.

  公开了一种基板处理设备，包括以下单元：供应单元，用于在基板 W 的图案形成表面上供应熔融状态的加工液，其中包括可升华物质；凝固单元，用于在图案形成表面上凝固加工液，以产生凝固体；以及升华单元，用于使凝固体升华，以从图案形成表面上去除凝固体。在该装置中，可升华物质包括氟化碳化合物。
• Substrate treating apparatus and substrate treating method
  申请人：SCREEN Holdings Co., Ltd.

  公开号：US10153181B2

  公开（公告）日：2018-12-11

  Disclosed is a substrate treating apparatus including the following units: a supplying unit which supplies a process liquid including a sublimable substance in a melt state on a pattern-formed surface of a substrate W; a solidifying unit which solidifies the process liquid on the pattern-formed surface to produce a solidified body; and a sublimating unit which sublimates the solidified body to remove the solidified body from the pattern-formed surface. In this apparatus, the sublimable substance includes a fluorinated carbon compound.

  公开了一种基板处理设备，包括以下单元：供应单元，用于在基板 W 的图案形成表面上供应熔融状态的加工液，其中包括可升华物质；凝固单元，用于在图案形成表面上凝固加工液，以产生凝固体；以及升华单元，用于使凝固体升华，以从图案形成表面上去除凝固体。在该装置中，可升华物质包括氟化碳化合物。
• SUBSTRATE TREATING METHOD, SUBSTRATE TREATING LIQUID AND SUBSTRATE TREATING APPARATUS
  申请人：SCREEN Holdings Co., Ltd.

  公开号：US20200135503A1

  公开（公告）日：2020-04-30

  A substrate treating method, liquid and apparatus are provided which can reduce the amount of sublimable substance used for the drying of a substrate while reducing the collapse of pattern. The substrate treating method includes a step of supplying a liquid to the pattern-formed surface of the substrate, a step of solidifying the liquid on the pattern-formed surface to form a solidified body and a step of subliming the solidified body so as to remove it from the pattern-formed surface. The substrate treating liquid includes a molten sublimable substance and a solvent, the freezing point of the sublimable substance being higher than the freezing point of the solvent. When the sublimable substance and the solvent are separated, the sublimable substance is settled and in the solidification step, the settled sublimable substance is solidified to have a height equal to or higher than the height of a pattern.