hexamethyltrisilane | 813-43-4

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 英文名称: hexamethyltrisilane
• 英文别名: 1,3-dihydro-1,1,2,2,3,3-hexamethyltrisilane；HMe2SiSiMe2SiMe2H；1,3-dihydrohexamethyltrisilane；H(SiMe2)3H；Bis(dimethylsilyl)-dimethylsilane；bis(dimethylsilyl)-dimethylsilane
• CAS: 813-43-4
• 化学式: C₆H₂₀Si₃
• 分子量: 176.481
• InChiKey: JSBOVJABZFDRGV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.82
• 重原子数：
  9
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  [Pt(dppe)(η2-C2H4)] 、 hexamethyltrisilane 以 甲苯 为溶剂， 以28%的产率得到[Pt(dppe)(μ-SiMe2)]2
  参考文献：
  名称：

  通过零价铂配合物与各种丙硅烷反应形成独特的铂-甲硅烷基配合物

  摘要：

  在另外两个硅原子上带有氢原子的丙硅烷与零价铂络合物 [Pt(dppe)(η2-C2H4)] 反应，得到各种类型的单核和双核铂-甲硅烷基络合物...

  DOI：

  10.1246/cl.2012.1538
• 作为产物：
  描述：

  二甲基-二(三甲基硅烷基)硅烷 在 aluminum tri-bromide 、 乙酰溴 、 甲基三苯基碘化鏻 、 三甲基锡 作用下， 以 正己烷 为溶剂， 生成 hexamethyltrisilane
  参考文献：
  名称：

  Base catalysed hydrogenation of methylbromooligosilanes with trialkylstannanes, identification of the first methylbromohydrogenoligosilanes

  摘要：

  The Lewis base catalysed hydrogenation of methylchlorooligsilanes with trialkylstannanes can also be applied to the hydrogenation of methylbromooligosilanes. In this way methylbromohydrogenoligosilanes were prepared for the first time. Methylbromotrisilanes with an > SiBrMe middle group (e.g. SiBrMe(2)-SiBrMe-SiBrMe(2)) are hydrogenated first at this silicon atom under formation of an > SiHMe group (e.g. SiBrMe(2)-SiHMe-SiBrMe(2)). Brominated silanes containing a quarternary Si(Si)(4) unit (e.g. Si(SiBrMe(2))(4)) do not react with trialkylstannanes.

  DOI：

  10.1016/s0022-328x(96)06552-7

文献信息

• Gas-phase photochemical reactions of dodecamethylcyclohexasilane with silicon compounds. kinetics of some insertion reactions of dimethylsilylene
  作者：Iain M.T. Davidson、Naaman A. Ostah

  DOI：10.1016/s0022-328x(00)83467-1

  日期：1981.2

  Attempts to measure the kinetics of gas-phase insertion reactions of dimethylsilylene, generated by photolysis of dodecamethylcyclohexasilane, are described. Insertion of dimethylsilylene into silicon—hydrogen bonds was the main reaction with trimethylsilane, pentamethyldisilane, and sym-tetramethyldisilane; in all cases the activation energy for insertion was zero, and the rate constants were in the

  描述了尝试测量由十二甲基环己硅烷的光解所产生的二甲基甲硅烷基的气相插入反应的动力学的尝试。二甲基亚甲硅进-氢键的插入是用三甲基硅烷主反应，pentamethyldisilane，和符号-tetramethyldisilane; 在所有情况下，插入的活化能均为零，速率常数的比率为1：3.1：4.3。二甲基亚甲硅烷基也以28 kJ mol -1的活化能干净地插入氯化氢中。与甲基氯硅烷的光化学反应要复杂得多，几乎不涉及或不涉及甲硅烷基化学。这样发生的反应似乎几乎完全是通过根本机理进行的。
• Electrochemical synthesis of symmetrical difunctional disilanes as precursors for organofunctional silanes
  作者：Christa Grogger、Bernhard Loidl、Harald Stueger、Thomas Kammel、Bernd Pachaly

  DOI：10.1016/j.jorganchem.2005.08.016

  日期：2006.1

  Difunctional disilanes of the general type XR2SiSiR2X (1–5) (X = OMe, H; R = Me, Ph, H) have been synthesized by electrolysis of the appropriate chlorosilanes XR2SiCl in an undivided cell with a constant current supply and in the absence of any complexing agent. Reduction potentials of the chlorosilane starting materials derived from cyclic voltammetry measurements were used to rationalize the results

  通用类型XR 2 SiSiR 2 X（1-5）（X = OMe，H; R = Me，Ph，H）的双官能乙硅烷是通过在恒定的不分隔电池中电解合适的氯硅烷XR 2 SiCl合成的在没有任何络合剂的情况下供电。由循环伏安法测量得出的氯硅烷原料的还原电位用于合理化制备性电解的结果。通式的MeO（ME的有机官能硅烷2）的SiC 6 H ^ 4 Y（图6a - Ç，7）随后通过反应得到的符号-对二甲氧基四甲基乙硅烷（1）在对位芳基溴化物BrC 6 H 4 Y（Y = OMe，NEt 2，NH 2）存在下具有NaOMe 。
• Basekatalysierte hydrierung von methylchlortri- und -tetrasilanen mit trialkylstannanen zu methylchlorwasserstofftri- und -tetrasilanen
  作者：U. Herzog、E. Brendler、G. Roewer

  DOI：10.1016/0022-328x(95)05927-h

  日期：1996.4

  The Lewis-base catalysed hydrogenation of methylchlorodisilanes with trialkylstannanes is also applicable to higher methylchlorooligosilanes without cleavage of the SiSi bonds. In this way it was possible to prepare methylchlorohydrogentri- and tetrasilanes. Using trisilanes with a SiClMe middle group the first hydrogenation takes place exclusively at this silicon atom under formation of a SiHMe group

  路易斯酸催化的甲基氯乙硅烷与三烷基锡烷的加氢反应也可用于高级甲基氯聚硅烷，而不会裂解SiSi键。以这种方式可以制备甲基氯氢三硅烷和四硅烷。使用具有SiClMe中间基团的三硅烷，第一次氢化仅在形成SiHMe基团的情况下在该硅原子上发生。
• Selective catalytic monoreduction of dichlorooligosilanes with Grignard reagents
  作者：Ken-ichiro Kanno、Yuka Niwayama、Soichiro Kyushin

  DOI：10.1016/j.tetlet.2013.10.050

  日期：2013.12

  Transition metal-catalyzed monoreduction of dichlorooligosilanes with Grignard reagents is reported. Among the examined catalysts, group 4 metal chlorides such as TiCl4 and Cp2TiCl2 gave the highest reactivity and good selectivity. The reducing power is effectively controlled by changing the catalysts and Grignard reagents to achieve sufficient selectivity depending on the oligosilane substrates.

  报道了用格氏试剂的过渡金属催化的二氯低聚硅烷的单还原。在所研究的催化剂中，第4组金属氯化物（如TiCl 4和Cp 2 TiCl 2）具有最高的反应活性和良好的选择性。通过改变催化剂和格氏试剂来有效地控制还原能力，从而根据低聚硅烷底物获得足够的选择性。
• Mercury-sensitized photolysis of Me2SiH2 The disproportionation reactions of the Me2SiH radical
  作者：C. Kerst、P. Potzinger

  DOI：10.1039/a605762d

  日期：——

  Mercury-sensitized photolysis of Me 2 SiH 2 yields in the primary step an Me 2 HSi radical and an H atom with a quantum yield of one. The Me 2 HSi radicals undergo a combination reaction [k(2)] as well as two kinds of disproportionation reactions leading to dimethylsilylene [k(3)] and 1-methylsilaethene [k(4)]. The following branching ratios have been determined: k(3)/[k(2)+k(3)+k(4)]=0.64 ±0.10 and k(4)/[k(2)+k(3)+k(4)]0.007. For Me 3 Si radicals the branching ratio for disproportionation was also determined and a value of 0.063 was obtained.

  Me 2 SiH 2 的汞敏化光解第一步产生一个 Me 2 HSi 自由基和一个 H 原子，量子产率为 1。Me 2 HSi 自由基会发生一个结合反应[k(2)]以及两种歧化反应，最终生成二甲基硅烷基[k(3)]和 1-甲基硅烷基[k(4)]。测定的支化率如下：k(3)/[k(2)+k(3)+k(4)]=0.64 ±0.10，k(4)/[k(2)+k(3)+k(4)]0.007。对于 Me 3 Si 自由基，还测定了歧化支化率，结果为 0.063。