3-hydroxy-1,1-bis(trifluoromethanesulfonyl)butane | 1187580-00-2

• 分子结构分类: 有机化合物 - 有机硫化合物 - 磺酰类
• 英文名称: 3-hydroxy-1,1-bis(trifluoromethanesulfonyl)butane
• 英文别名: 4,4-bis(trifluoromethylsulfonyl)butan-2-ol
• CAS: 1187580-00-2
• 化学式: C₆H₈F₆O₅S₂
• 分子量: 338.249
• InChiKey: RGALDGUTLKXBGN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  105
• 氢给体数：
  1
• 氢受体数：
  11

反应信息

• 作为反应物：
  描述：

  3-hydroxy-1,1-bis(trifluoromethanesulfonyl)butane 在 sodium hydroxide 作用下， 以 水 为溶剂， 反应 1.0h， 生成 3-hydroxy-1,1-bis(trifluoromethanesulfonyl)butane sodium
  参考文献：
  名称：

  EP2264007

  摘要：

  公开号：
• 作为产物：
  描述：

  在 水 作用下， 生成 3-hydroxy-1,1-bis(trifluoromethanesulfonyl)butane
  参考文献：
  名称：

  EP2264007

  摘要：

  公开号：

文献信息

• Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method
  申请人：Nagamori Masashi

  公开号：US20110070544A1

  公开（公告）日：2011-03-24

  There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.

  提供了一种具有含氟碳阴离子结构的酸或含有含氟碳阴离子结构的盐，其表示为以下一般式（1）。通过使用生成此酸的化学增感抗蚀材料的光酸发生剂，可以提供一种对ArF准分子激光等具有高灵敏度的光酸发生剂，其生成的酸（光生成酸）具有足够高的酸度，并且具有与树脂的高溶解度和优越的相容性，以及包含这样的光酸发生剂的抗蚀材料。
• Proton Conducting Polymer Membrane, Membrane-Electrode Assembly Using Same, and Polymer Electrolyte Fuel Cell
  申请人：Tanaka Toru

  公开号：US20140023953A1

  公开（公告）日：2014-01-23

  Disclosed is a proton conducting polymer membrane formed by laminating a plurality of solid electrolyte membranes. This proton conducting polymer membrane is one prepared by laminating at least one layer of a solid electrolyte membrane formed by using a resin having a bis(perfluoroalkanesulfonyl)methide group in the chemical structure. This solid electrolyte membrane has a superior proton conductivity without transmitting the fuel (methanol or hydrogen).

  本发明揭示了一种通过层压多个固态电解质膜形成的质子导电聚合物膜。该质子导电聚合物膜是通过层压至少一层使用具有双(全氟烷基磺酰基)甲基基团的树脂形成的固态电解质膜制备的。该固态电解质膜具有优异的质子导电性，同时不传输燃料（甲醇或氢气）。
• Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method
  申请人：Nagamori Masashi

  公开号：US08580486B2

  公开（公告）日：2013-11-12

  There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.

  提供了一种具有含氟碳负离子结构的酸或盐，其由以下通式（1）表示。通过使用生成此酸的化学放大光刻胶材料的光酸发生剂，可以提供一种对ArF准分子激光光或类似光具有高灵敏度的光酸发生剂，其生成的酸（光产生的酸）具有足够高的酸度，并且具有高溶解度和优良的树脂相容性，以及含有这种光酸发生剂的光刻胶材料。
• NOVEL SALT HAVING FLUORINE-CONTAINING CARBANION STRUCTURE, DERIVATIVE THEREOF, PHOTOACID GENERATOR, RESIST MATERIAL USING THE PHOTOACID GENERATOR, AND PATTERN FORMING METHOD
  申请人：Central Glass Company, Limited

  公开号：EP2264007A1

  公开（公告）日：2010-12-22

  There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.

  提供了一种具有含氟碳离子结构的酸或具有含氟碳离子结构的盐，其通式如下（1）。 通过使用产生这种酸的化学放大抗蚀剂材料用光酸发生器，可以提供一种对 ArF 准分子激光或类似光具有高灵敏度的光酸发生器，其中生成的酸（光产生的酸）具有足够高的酸度，并且在抗蚀剂溶剂中具有高溶解性，与树脂具有良好的相容性，还可以提供一种含有这种光酸发生器的抗蚀剂材料。
• Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method
  申请人：Central Glass Company, Limited

  公开号：US20130137037A1

  公开（公告）日：2013-05-30

  A silicon compound according to the present invention is represented by the general formula (1). This silicon compound can be easily synthesized by using a hydrolysable silicon compound such as alkoxysilane and has, in its molecule, a hydrolysable group e.g. alkoxy group and a photoacid generating group capable of being dissociated to generate an acid by irradiation with a high-energy ray. R 1 n A m SiB 4-(n+m) (1) where R 1 is each independently a hydrogen atom, a C 1 -C 20 straight or C 3 -C 20 branched or cyclic hydrocarbon group; a carbon atom of the hydrocarbon group may be replaced by an oxygen atom; and the hydrocarbon group may contain a fluorine atom; A is an acid decomposable group; B is a hydrolysable group; n is an integer of 0 to 2; m is an integer of 1 to 3; and n+m is an integer of 1 to 3.