(Z)-2,3-dimethylchroman-4-one

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: (Z)-2,3-dimethylchroman-4-one
• 英文别名: 2,3-dimethylchroman-4-one；2,3-Dimethyl-4-chromanone；2,3-dimethyl-2,3-dihydrochromen-4-one
• 化学式: C₁₁H₁₂O₂
• 分子量: 176.215
• InChiKey: UIYNLWMFVBFECH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-(三甲基硅)苯基三氟甲烷磺酸盐 、 反式-2,3-二甲基丙烯酸 在 cesium fluoride 作用下， 以 四氢呋喃 为溶剂， 反应 24.0h， 以28.571%的产率得到
  参考文献：
  名称：

  羧酸与芳炔的分子间 C-O 加成：邻羟基芳基酮、呫吨酮、4-苯并二氢吡喃酮和黄酮的合成

  摘要：

  利用现成的羧酸和市售的邻(三甲基甲硅烷基)芳基三氟甲磺酸酯，开发了一种有效且简单的途径来生产生物学和药学上重要的邻羟基芳基酮、呫吨酮、 4-色满酮和黄酮。

  DOI：

  10.1016/j.tet.2013.01.078

文献信息

• Intermolecular C−O Addition of Carboxylic Acids to Arynes
  作者：Anton V. Dubrovskiy、Richard C. Larock

  DOI：10.1021/ol101017z

  日期：2010.7.16

  A novel, efficient, and expedient route to biologically and pharmaceutically important o-hydroxyaryl ketones, xanthones, 4-chromanones, and flavones has been developed starting from readily available carboxylic acids and commercially available o-(trimethylsilyl)aryl triflates.

  从容易获得的羧酸和市售的邻-(三甲基甲硅烷基)芳基三氟甲磺酸酯开始，已经开发出一种新颖、有效和方便的途径来制备生物学和药学上重要的邻羟基芳基酮、氧杂蒽酮、4-色满酮和黄酮。
• 1H-imidazole-5-carboxylic acid derivatives
  申请人：JANSSEN PHARMACEUTICA N.V.

  公开号：EP0277384A3

  公开（公告）日：1990-05-23

  A method of controlling weeds by applying thereto or to the locus thereof of an imidazole derivative of formula wherein R1 is hydrogen or mercapto;L is cyano or a radical of formulaX is 1-indanyl, 1-tetrahydronaphthalenyl, 5-benzocycloheptanyl, 4-tetrahydrobenzothienyl, 4-tetrahydroben- zofuryl, 5-tetrahydroquinolyl, 5-tetrahydroisoquinolyl, 8-tetrahydroquinolyl, 8-tetrahydroisoquinolyl, 9,10-dihydro-9-antracenyl, 9H-fluoren-9-yl, 5-dibenzo[a,d]-cycloheptenyl, 5-dibenzo[a,d]cycloheptanyl or 1-dihydronaphthalenyl each unsubstituted or substituted; or X is a group or a group - ; whereinn is 0, 1 or 2 or two; A is hydrogen, optionally substituted C3-C7cycloalkyl or pyridinyl, pyrimidinyl, naphthalenyl, f6ranyt and thienyl, each unsubstituted or substituted; Z is naphthalenyl, thienyl, furanyl, pyrimidinyl, phenyl or pyridinyl, each unsubstituted or substituted;a salt or stereoisomeric form thereof, novel compounds for use in said method; herbicidal compositions containing such compounds as active ingredient and methods of preparing said compounds.

  一种通过将咪唑衍生物应用于杂草或其生长地点来控制杂草的方法，其中该衍生物的结构式为R1为氢或巯基；L为氰基或结构式的基团；X为1-吲哚基、1-四氢萘基、5-苯并环庚基、4-四氢苯并噻吩基、4-四氢苯并噻喃基、5-四氢喹啉基、5-四氢异喹啉基、8-四氢喹啉基、8-四氢异喹啉基、9,10-二氢-9-蒽基、9H-芴-9-基、5-二苯并[a,d]-环庚基、5-二苯并[a,d]环庚基或1-二氢萘基，每个未取代或取代；或X为一个基团或一个基团-；其中n为0、1或2或两个；A为氢，可选地取代的C3-C7环烷基或吡啶基、嘧啶基、萘基、富兰基和噻吩基，每个未取代或取代；Z为萘基、噻吩基、呋喃基、嘧啶基、苯基或吡啶基，每个未取代或取代；其盐或立体异构体形式，用于该方法的新化合物；含有这种化合物作为活性成分的除草剂组合物以及制备这种化合物的方法。
• MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20110294070A1

  公开（公告）日：2011-12-01

  A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。
• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。