Phenol-o-kresol-phthalein | 854-76-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并呋喃
• 英文名称: Phenol-o-kresol-phthalein
• 英文别名: 3-(3'-Methyl-4'-hydroxyphenyl)-3-(4'-hydroxyphenyl) phthalide；3-(4-hydroxy-3-methylphenyl)-3-(4-hydroxyphenyl)-2-benzofuran-1-one
• CAS: 854-76-2
• 化学式: C₂₁H₁₆O₄
• 分子量: 332.356
• InChiKey: BEUFVKQEPLYBIU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  25
• 可旋转键数：
  2
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  Phenol-o-kresol-phthalein 在 氢氧化钾 、 硫酸 、 硫酸羟胺 作用下， 反应 3.7h， 生成 2-(3-乙基-4-羟基苯甲酰基)苯甲酸
  参考文献：
  名称：

  Ruminski, Polish Journal of Chemistry, 1997, vol. 71, # 7, p. 908 - 914

  摘要：

  DOI：
• 作为产物：
  描述：

  2-(3-methyl-4-hydroxybenzoyl)benzoic acid 、 苯酚 在 硫酸 、 zinc(II) chloride 作用下， 生成 Phenol-o-kresol-phthalein
  参考文献：
  名称：

  Hubacher et al., Journal of the American Pharmaceutical Association (1912), 1953, vol. 42, p. 23,26

  摘要：

  DOI：

文献信息

• Photoresist underlayer film-forming composition and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2813889A2

  公开（公告）日：2014-12-17

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，一种包含由酚酞、酚红、甲酚酞、甲酚红或百里酚酞递归单元组成的酚醛树脂的组合物用于形成光阻底层膜。底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• Underlayer film-forming composition and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10228621B2

  公开（公告）日：2019-03-12

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，一种包含由酚酞、酚红、甲酚酞、甲酚红或百里酚酞递归单元组成的酚醛树脂的组合物用于形成光阻底层膜。底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• Ghatak, 1933, vol. 2, p. 253,256
  作者：Ghatak

  DOI：——

  日期：——
• New chemical markers based on phthaleins
  作者：S. V. Nekhoroshev、V. P. Nekhoroshev、O. Kh. Poleshchuk、A. G. Yarkova、A. V. Nekhorosheva、A. K. Gasparyan

  DOI：10.1134/s1070427215040278

  日期：2015.4

  New chemical markers based on mixtures of individual phthaleins were developed. These markers are characterized by high level of secrecy in use, good transferability to contacting persons, enhanced retention on the objects marked, and reliable identification of phthaleins by expert investigation. The experimental studies of the markers obtained show that the synthesized mixture of three phthalein homologs contains the previously unknown phthalein with unsymmetrical phenolic substituents, o-cresolphenolphthalein [3-(3'-methyl-4'-hydroxyphenyl)-3-(4aEuro(3)-hydroxyphenyl)phthalide], which decreases the probability of the marker falsification. Quantum-chemical calculations of the reaction of the o-cresolphthalein synthesis show that the overall reaction is characterized by small positive changes in the enthalpy and Gibbs free energy, and the second and third steps occur with negative changes in the Gibbs energy. The optimum structure of the transition state was calculated.
• UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140363955A1

  公开（公告）日：2014-12-11

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO 2 substrates.