N'-hydroxy-4,4-dimethyl-5-oxopentanimidamide

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N'-hydroxy-4,4-dimethyl-5-oxopentanimidamide
• 化学式: C₇H₁₄N₂O₂
• 分子量: 158.2
• InChiKey: MHNNFEUCQRHAQE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  11
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  75.7
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION
  申请人：Lee Wai Mun

  公开号：US20090111965A1

  公开（公告）日：2009-04-30

  The present application relates to semiconductor processing compositions comprising at least one compound containing at least one amidoxime functional group and to methods of using these compositions in semiconductor processing. The present application also describes the preparation of amidoximes for a semiconductor processing composition by (a) mixing a cyanoethylation catalyst, a nucleophile and an alpha-unsaturated nitrile to produce a cyanoethylation product; and (b) converting a cyano group in the cyanoethylation product into an amidoxime functional group.

  本申请涉及包含至少一个含有至少一个酰胺肟功能团的化合物的半导体加工组合物，以及使用这些组合物进行半导体加工的方法。本申请还描述了通过(a)混合氰乙基化催化剂、亲核试剂和不饱和α腈以产生氰乙基化产品；(b)将氰乙基化产品中的氰基团转化为酰胺肟功能团来制备用于半导体加工组合物的酰胺肟的方法。
• PROCESS OF PURIFICATION OF AMIDOXIME CONTAINING CLEANING SOLUTIONS AND THEIR USE
  申请人：Lee Wai Mun

  公开号：US20100105594A1

  公开（公告）日：2010-04-29

  The invention relates to processes for producing and using amidoxime compounds with low trace metal impurities. The invention further relates to compositions comprising amidoxime compounds with low trace metal impurities, such compositions useful for cleaning or removing residues from semiconductor substrates and/or equipment.

  本发明涉及生产和使用低微量金属杂质的酰胺肟化合物的方法。本发明还涉及包含低微量金属杂质的酰胺肟化合物的组合物，这种组合物可用于清洁或去除半导体基板和/或设备中的残留物。
• US7838483B2
  申请人：——

  公开号：US7838483B2

  公开（公告）日：2010-11-23