1-Butanaminium, N,N,N-triethyl- | 23614-75-7

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1-Butanaminium, N,N,N-triethyl-
• 英文别名: butyl(triethyl)azanium
• CAS: 23614-75-7
• 化学式: C10H24N+
• 分子量: 158.3
• InChiKey: MPDDDPYHTMZBMG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  11
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• [EN] IONIC LIQUIDS BASED ON OXALIC ACID MONO ESTERS<br/>[FR] LIQUIDES IONIQUES À BASE DE MONOESTERS DE L'ACIDE OXALIQUE
  申请人：BASF SE

  公开号：WO2014056844A1

  公开（公告）日：2014-04-17

  Monosubstituted oxalic acid derivatives of the general formula (I) [A]+[O-C(O)-C(O)-O-X]-, wherein the meaning is: for [A]+, a cation made from an organic moiety A having a formally positively charged heteroatom selected from the group consisting of nitrogen, phosphorus and sulfur, X is a C1 to C30 organic residue, and wherein the following compounds (I) are disclaimed:tetramethylammonium monomethyloxalate methyltri(alkyl)ammonium monomethyloxalate trimethyl(1-hydroxyethyl)ammonium monomethyloxalate methyltriethylammonium monomethyloxalate tetraethylammonium monomethyloxalate n-propyltriethylammonium mono-n-propyloxalate n-butyltriethylammonium mono-n-butyloxalate benzyltriethylammonium monobenzyloxalate cyclohexyldimethylammonium monomethyloxalate dimethyl-phenylammonium monomethyloxalate. Tetrabutylammonium monomethyloxalate N-methylpyridinium monomethyloxalate N-ethylpyridinium monoethyloxalate N-n-propylpyridinium mono-n-propyloxalate N-n-butylpyridinium mono-n-butyl-oxalate N-benzylpyridinium monobenzyloxalate N-methyl-isochinolinium monomethyloxalate N-ethyl-isochinolinium monoethyloxalate N-n-propyl-isochinoliniummono-n-propyloxalate N-n-butyl-isochinolinium mono-n-butyloxalate N-benzyl-isochinolinium monobenzyloxalate.

  单取代草酸衍生物的一般式(I) [A]+[O-C(O)-C(O)-O-X]-，其中含义为：对于[A]+，是由有机基团A形成的阳离子，其正式带正电的杂原子选自氮、磷和硫组成的群，X是一个C1到C30的有机残基，且以下化合物(I)被否认：四甲基铵单甲氧草酸酯 甲基三(烷基)铵单甲氧草酸酯 三甲基(1-羟乙基)铵单甲氧草酸酯 甲基三乙基铵单甲氧草酸酯 四乙基铵单甲氧草酸酯 正丙基三乙基铵单正丙氧草酸酯 正丁基三乙基铵单正丁氧草酸酯 苄基三乙基铵单苄氧草酸酯 环己基二甲基铵单甲氧草酸酯 二甲基苯基铵单甲氧草酸酯。 四丁基铵单甲氧草酸酯 N-甲基吡啶铵单甲氧草酸酯 N-乙基吡啶铵单乙氧草酸酯 N-正丙基吡啶铵单正丙氧草酸酯 N-正丁基吡啶铵单正丁氧草酸酯 N-苄基吡啶铵单苄氧草酸酯 N-甲基异喹啉铵单甲氧草酸酯 N-乙基异喹啉铵单乙氧草酸酯 N-正丙基异喹啉铵单正丙氧草酸酯 N-正丁基异喹啉铵单正丁氧草酸酯 N-苄基异喹啉铵单苄氧草酸酯。
• CARBOXYLIC ACID DERIVATIVES AND ADHESION MOLECULE INHIBITORS CONTAINING THE SAME AS THE ACTIVE INGREDIENT
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP1209147A1

  公开（公告）日：2002-05-29

  Prevention or therapy of inflammatory diseases caused by invasion of leukocytes such as monocytes, lymphocytes and eosinophils, by providing a substance which inhibits cell adhesion via an adhesion molecule, especially adhesion molecule VLA-4, is disclosed. A group of carboxylic acid derivatives represented by, for example, and adhesion molecule inhibitors comprising the same as an effective ingredient were provided.

  通过提供一种通过粘附分子抑制细胞粘附的物质，特别是粘附分子VLA-4，来预防或治疗由单核细胞、淋巴细胞和嗜酸性粒细胞侵袭引起的炎症性疾病的方法被揭示。提供了一组由羧酸衍生物代表的粘附分子抑制剂，例如，以其为有效成分的粘附分子抑制剂。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP
  申请人：Shibayama Wataru

  公开号：US20110143149A1

  公开（公告）日：2011-06-16

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R 1 a R 2 b Si(R 3 ) 4-(a+b) . A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.

  提供一种用于光刻的抗蚀底层膜形成组合物，用于形成可用作硬掩膜或底部防反射涂层的抗蚀底层膜，或者是不与抗蚀剂混合且具有比抗蚀剂更高的干法刻蚀速率的抗蚀底层膜。该组合物包括具有离子基的硅烷化合物，其中具有离子基的硅烷化合物是一种可水解的有机硅烷，其分子中具有一个离子基、其水解产物或水解缩合产物。该组合物用作光刻的抗蚀底层膜形成组合物。组合物包括具有离子基的硅烷化合物和不具有离子基的硅烷化合物，其中具有离子基的硅烷化合物在整个硅烷化合物中的摩尔比例小于1％，例如为0.01到0.95％。可水解的有机硅烷可以是式的化合物：R1aR2bSi（R3）4-（a+b）。通过将所述组合物按照权利要求1至14中的任一项涂布到半导体基片上并烘烤所得到的抗蚀底层膜。
• [EN] METHOD FOR SEPARATING CARBINOLS<br/>[FR] PROCEDE DE SEPARATION DE CARBINOLS
  申请人：LABORATORIOS DEL DR. ESTEVE, S.A.

  公开号：WO1997020817A1

  公开（公告）日：1997-06-12

  (EN) A method for predominantly preparing the enantiomer (R)-(+)-5-(phenyl)hydroxymethyl-1-methyl-1H-pyrazole, (R)-(+)-1, by separating the racemate (+)-5-(phenyl)hydroxymethyl-1-methyl-1H-pyrazole of formula (1), comprising the series of steps of using a lipase or material derived therefrom having enzymatic activity in a transesterification reaction, as well as hydrolysing the resulting ester, (S)-(-)-5-(phenyl)alkylcarbonyloxymethyl-1-methyl-1H-pyrazole, of formula (S)-(-)-4, wherein R1 is a methyl or ethyl radical.(FR) La présente invention concerne un procédé pour préparer de façon prédominante l'énantiomère (R)-(+)-5-(phényl)hydroxyméthyl-1-méthyl-1H-pyrazole, (R)-(+)-1, par séparation du mélange racémique (+)-5-(phényl)hydroxyméthyl-1-méthyl-1H-pyrazole, de formule (1), qui se caractérise par un procédé séquentiel qui comprend l'utilisation d'une lipase ou d'une matière dérivée de celle-ci possédant une activité enzymatique en une réaction de transestérification, ainsi que l'hydrolyse de l'ester formé, (S)-(-)-5-(phényl)alkylcarbonyloxyméthyl-1-méthyl-1H-pyrazole, de formule (S)-(-)-4 dans laquelle R1 représente un radical méthyle ou éthyle.

  一种主要制备对映体（R）-（+）-5-（苯基）羟甲基-1-甲基-1H-吡唑的方法，即（R）-（+）-1，通过分离式样式为（1）的混合物（+）-5-（苯基）羟甲基-1-甲基-1H-吡唑的拉丁酸盐，包括使用脂肪酶或其衍生物在酯交换反应中具有酶活性，以及水解所得酯（S）-（-）-5-（苯基）烷基羰基氧甲基-1-甲基-1H-吡唑，式为（S）-（-）-4，其中R1为甲基或乙基基团。
• Ionic Liquid and Process for Producing the Same
  申请人：Itoh Toshiyuki

  公开号：US20070219379A1

  公开（公告）日：2007-09-20

  The present invention provides an ionic liquid that can widely be used as materials of various electrical devices and solvents for various reactions and that exhibits hydrophobicity causing phase separation from water, and a process for producing the ionic liquid. The ionic liquid contains at least one anion selected from the group consisting of a fluoroalkylsulfate anion, a fluorocycloalkylsulfate anion, and a fluorobenzylsulfate anion and exhibits hydrophobicity causing phase separation from water. The halide ion concentration of the ionic liquid may be 70 ppm or less.

  本发明提供了一种离子液体，可广泛用作各种电气设备和各种反应的溶剂材料，并表现出疏水性，从水中分离出相，并提供了制备该离子液体的方法。该离子液体包含至少一种阴离子，所述阴离子选自氟烷基硫酸盐阴离子、氟环烷基硫酸盐阴离子和氟苯基硫酸盐阴离子的群组，并表现出疏水性，从水中分离出相。该离子液体的卤化物离子浓度可以为70 ppm或更低。