申请人:Toagosei Chemical Industry Co., Inc., Ltd.
公开号:US05441717A1
公开(公告)日:1995-08-15
A process for producing an antimicrobial compound represented by the following formula [1]: M.sup.1.sub.a H.sub.b A.sup.1.sub.c M.sup.2.sub.2 (PO.sub.4).sub.3.nH.sub.2 O [1] wherein M.sup.1 is at least one metal ion selected from silver, copper, zinc, tin, mercury, lead, iron, cobalt, nickel, manganese, arsenic, antimony, bismuth, barium, cadmium and chromium, A.sup.1 is at least one ion selected from alkali metal ion and alkaline earth metal ion, M.sup.2 is a tetravalent metal, n is a number which satisfies 0.ltoreq.n.ltoreq.6, a and b are positive numbers and c is 0 or a positive number, and a, b and c satisfy ka+b+mc=1 where k is a valence of M.sup.1 and m is a valence of A.sup.1, by supporting at least one metal ion selected from silver, copper, zinc, tin, mercury, lead, iron, cobalt, nickel, manganese, arsenic, antimony, bismuth, barium, cadmium and chromium on a phosphate represented by the following formula [2]: A.sup.2.sub.d M.sup.2.sub.2 (PO.sub.4).sub.3.nH.sub.2 O [2] wherein A.sup.2 is at least one ion selected from alkali metal ion, alkaline earth metal ion and ammonium ion, M.sup.2 and n are as defined above and d is 1/m' where m' is a valence of A.sup.2, characterized in that said phosphate is synthesized by a wet process and furthermore characterized in that a step of supporting hydrogen ion and a step of firing at 500.degree. to 1300.degree. C. are employed.
一种生产抗微
生物化合物的工艺,其由以下式[1]表示:M.sup.1.sub.a H.sub.b A.sup.1.sub.c M.sup.2.sub.2 (PO.sub.4).sub.3.nH.sub.2 O [1],其中M.sup.1是从
银、
铜、
锌、
锡、
汞、
铅、
铁、
钴、
镍、
锰、
砷、
锑、
铋、
钡、
镉和
铬中选择的至少一种
金属离子,A.sup.1是从碱
金属离子和碱土
金属离子中选择的至少一种离子,M.sup.2是四价
金属,n是满足0≤n≤6的数字,a和b是正数,c是0或正数,且a、b和c满足ka+b+mc=1,其中k是M.sup.1的化合价,m是A.sup.1的化合价,通过将至少一种从
银、
铜、
锌、
锡、
汞、
铅、
铁、
钴、
镍、
锰、
砷、
锑、
铋、
钡、
镉和
铬中选择的
金属离子支持在以下式[2]表示的
磷酸盐上:A.sup.2.sub.d M.sup.2.sub.2 (PO.sub.4).sub.3.nH.sub.2 O [2],其中A.sup.2是从碱
金属离子、碱土
金属离子和
铵离子中选择的至少一种离子,M.sup.2和n如上所定义,d是1/m',其中m'是A.sup.2的化合价,其特征在于所述
磷酸盐是通过湿法合成的,并且进一步特征在于采用了支持氢离子的步骤和在500°C至1300°C烧结的步骤。