(2-Methylpropyl)malonodinitrile | 30963-89-4

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: (2-Methylpropyl)malonodinitrile
• 英文别名: (2-methylpropyl)malononitrile；Isobutylmalonnitril；isobutyl-malononitrile；Isobutylmalononitrile；2-(2-methylpropyl)propanedinitrile
• CAS: 30963-89-4
• 化学式: C₇H₁₀N₂
• mdl: MFCD06215005
• 分子量: 122.17
• InChiKey: OZIRUVADHRKHPZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  9
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.714
• 拓扑面积：
  47.6
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 phosphorus pentoxide 作用下， 生成 (2-Methylpropyl)malonodinitrile
  参考文献：
  名称：

  Henry, Jahresbericht ueber die Fortschritte der Chemie und Verwandter Theile Anderer Wissenschaften, 1889, p. 640

  摘要：

  DOI：

文献信息

• Sodium Borohydride as the Only Reagent for the Efficient Reductive Alkylation­ of Malononitrile with Ketones and Aldehydes
  作者：Robert E. Sammelson、Jason C. Dunham、Adam D. Richardson

  DOI：10.1055/s-2006-926307

  日期：——

  malononitriles has been developed. In this method, sodium borohydride in isopropanol has a catalytic effect on the initial condensation between malononitrile and aldehydes or ketones at 0 °C. The sodium borohydride also simultaneously acts as a reagent and reduces the unsaturated intermediate formed in situ by the condensation. This simple reductive alkylation method effectively consumes all malononitrile

  开发了一种高效、简便的单取代丙二腈的合成方法。在该方法中，异丙醇中的硼氢化钠对丙二腈与醛或酮在0℃下的初始缩合具有催化作用。硼氢化钠还同时充当试剂并还原通过缩合原位形成的不饱和中间体。这种简单的还原烷基化方法有效地消耗了所有丙二腈并选择性地仅生产单取代的丙二腈。通过这些单取代衍生物的烷基化制备不对称二取代丙二腈。
• Rh-Catalyzed One-Pot Reductive Alkylation of Malononitrile Under Transfer Hydrogenation Conditions
  作者：Jiashou Wu、Huajiang Jiang

  DOI：10.1080/00397911.2010.481741

  日期：2011.3.28

  Abstract Efficient synthesis of monosubstituted malononitriles was achieved by one-pot reductive alkylation of malononitrile with carbonyl compounds via [Cp*RhCl2]2-catalyzed transfer hydrogenation reaction.

  摘要 通过 [Cp*RhCl2]2 催化转移氢化反应，将丙二腈与羰基化合物一锅法还原烷基化，实现了单取代丙二腈的高效合成。
• CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE
  申请人：Lee Wai Mun

  公开号：US20090130849A1

  公开（公告）日：2009-05-21

  A composition and associated method for chemical mechanical planarization (or other polishing) is described. The composition contains an amidoxime compound and water. The composition may also contain an abrasive and a compound with oxidation and reduction potential. The composition is useful for attaining improved removal rates for metal, including copper, barrier material, and dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications.

  本文描述了一种化学机械平整化（或其他抛光）的组合物及其相关方法。该组合物含有一种酰胺肟化合物和水。该组合物还可以含有磨料和具有氧化还原潜力的化合物。该组合物可用于在金属CMP中获得改进的金属去除速率，包括铜、屏障材料和金属CMP中的介电层材料。该组合物在金属CMP应用的相关方法中特别有用。
• METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS
  申请人：Lee Wai Mun

  公开号：US20100043823A1

  公开（公告）日：2010-02-25

  The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.

  本发明涉及含有酰胺肟化合物的水性组合物及其清洗半导体衬底上等离子体刻蚀残留物的方法，包括这种稀释的水性溶液。本发明的组合物可以选择性地含有一种或多种其他酸性化合物、一种或多种碱性化合物、含氟化合物和其他成分，如有机溶剂、螯合剂、胺和表面活性剂。本发明还涉及一种在集成电路制造过程中从衬底上去除残留物的方法。
• COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS
  申请人：Lee Wai Mun

  公开号：US20100105595A1

  公开（公告）日：2010-04-29

  The present invention is a novel aqueous cleaning solution for use in semiconductor front end of the line (FEOL) manufacturing process wherein the cleaning solution comprises at least one amidoxime compound.

  本发明是一种用于半导体前端制造过程中的新型水性清洗溶液，其中清洗溶液包含至少一种酰胺肟化合物。