Benzene-1,2,3-triol;methanesulfonic acid | 114513-43-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: Benzene-1,2,3-triol;methanesulfonic acid
• CAS: 114513-43-8
• 化学式: C7H10O6S
• 分子量: 222.22
• InChiKey: KTNISUQDBOGEFU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.31
• 重原子数：
  14
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  123
• 氢给体数：
  4
• 氢受体数：
  6

文献信息

• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP
  申请人：Kyowa Hakko Chemical Co., Ltd.

  公开号：EP1661918A1

  公开（公告）日：2006-05-31

  The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O-C-C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).

  本发明提供了一种生产具有由通式（II）表示的基团的化合物的方法：（其中R1、R2和R3可以相同也可以不同，并且分别表示取代或未取代的烷基、取代或未取代的芳基、或取代或未取代的芳基烷基，或者R1和R2可以相互结合形成与相邻碳原子一起的脂环碳氢环，或者R2和R3可以相互结合形成与相邻的O-C-C一起具有取代基的脂环杂环）的方法，该方法包括允许具有羟基的化合物与由通式（I）表示的卤代烷基醚发生反应：（其中R1、R2和R3分别与上述定义相同，X代表卤素原子）。
• PROCESS FOR PRODUCING ETHER COMPOUND
  申请人：Kyowa Yuka Co., Ltd.

  公开号：EP1415968A1

  公开（公告）日：2004-05-06

  The present invention provides the following process for produci ng and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom,    which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

  本发明提供了以下用于生产等的过程，该过程能够生产醚化合物，该化合物对于化学放大型抗蚀组合物、药物合成中间体、涂料等具有用途，且副反应较少且产率高。一种生产具有由通式（II）表示的基团的醚化合物的方法，其中R1、R2和R3可以相同也可以不同，并表示取代或未取代的烷基、取代或未取代的芳基或取代或未取代的芳基烷基，或者R1和R2与相邻碳原子一起形成环烷基，包括允许具有羟基（包括羧基）的化合物与由通式（I）表示的烯基醚发生反应，其中R1、R2和R3分别具有上述定义的相同含义。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2010046240A1

  公开（公告）日：2010-04-29

  Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

  化合物的公式（I），其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基，萘基，联苯基或杂环基，均可选取代; 或者例如Ar1和Ar2与直接键，O，S或（CO）一起形成融合的环系统; R例如是氢，C3-C30环烷基或C1-C18烷基; R1，R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂（PAG）。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。