Methyl-<4-hydroxy-pheny>-phenyl-sulfonium | 46407-77-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: Methyl-<4-hydroxy-pheny>-phenyl-sulfonium
• 英文别名: (4-Hydroxyphenyl)methylphenylsulfonium；(4-hydroxyphenyl)-methyl-phenylsulfanium
• CAS: 46407-77-6
• 化学式: C₁₃H₁₃OS
• 分子量: 217.312
• InChiKey: VDIBXVZUFJCSDT-UHFFFAOYSA-O

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  21.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Harada Yukako

  公开号：US20080081293A1

  公开（公告）日：2008-04-03

  The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  本发明提供了一种盐，其表示为公式（I）：其中P1、P2和P3各自独立地表示一个C1-C30烷基基团，该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代，或者一个C3-C30环烃基团，该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代，前提是P1、P2和P3均不同时为可以被取代的苯基；Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团，R表示由以下公式表示的一个基团：其中A1表示—OH或—Y1—OH，n表示1到9之间的整数，Y1表示二价的C1-C6饱和脂肪族碳氢基团；一个由以下公式表示的基团：其中环X1表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—CO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X2表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团的氢原子被羟基取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X3表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—COO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代，m表示0到12之间的整数；或者一个由以下公式表示的基团：其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团，多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代，l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物，其包含上述公式（I）表示的盐。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030170561A1

  公开（公告）日：2003-09-11

  A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), 1 wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

  一种辐射敏感的树脂组合物，包括（A）含有酸可解离基团的聚硅氧烷和（B）含有三氟甲烷磺酸或生成以下式（I）酸的化合物的光酸发生剂，其中Rf分别表示氟原子或三氟甲基基团，Ra表示氢原子，氟原子，具有1-20个碳原子的线性或支链烷基，或具有1-20个碳原子的线性或支链氟烷基，具有3-20个碳原子的取代或未取代的单价环烃基或具有3-20个碳原子的取代或未取代的单价环氟烃基。本发明的辐射敏感树脂组合物表现出优异的分辨率，同时保持对辐射的高透明度和高干法刻蚀抵抗力。因此，该树脂组合物可以为未来变得越来越微小的光刻工艺做出巨大贡献。
• POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1398339A1

  公开（公告）日：2004-03-17

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B) .

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有酸可分解基团的树脂、 其中，R1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂肪族基团，R2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物（A）包括聚硅氧烷（A）和光酸发生器（B）。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1726608A1

  公开（公告）日：2006-11-29

  A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol% but not more than 70 mol%, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.

  本发明提供了一种在 193 纳米或更低波长下具有高透明度的硅氧烷树脂，它非常适合用作特别是用于制造 LSI 的辐射敏感树脂组合物中的树脂成分，还提供了一种用作化学放大抗蚀剂的辐射敏感树脂组合物，它具有优异的焦深（DOF）和显著减少显影缺陷的能力。 硅氧烷树脂在同一分子中包含下式（I）所示的结构单元（I）和下式（II）所示的结构单元（II），结构单元（I）和结构单元（II）的含量超过 0 摩尔%，但不超过 70 摩尔%、 其中 A 和 B 分别代表二价直链、支链或环状烃基，R1 代表一价酸可分解基团，R2 代表直链、支链或环状烷基。 辐射敏感树脂组合物包括 (a) 硅氧烷树脂和 (b) 光酸发生器。
• Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition
  申请人：——

  公开号：US20010041769A1

  公开（公告）日：2001-11-15

  A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), 1 wherein A 1 and A 2 are an acid-dissociable monovalent organic group, R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R 2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

  一种新型聚硅氧烷，具有以下结构单元(I)和/或(II)以及结构单元(III)、 1 其中 A 1 和 A 2 是可被酸分解的单价有机基团，R 1 是氢、一价（卤代）烃、卤素或氨基，R 2 是一价（卤代）烃基或卤素。此外，还提供了制备这种聚硅氧烷的方法、提供这种聚硅氧烷的含硅脂环化合物以及包含这种聚硅氧烷的辐射敏感树脂组合物。这种聚硅氧烷可用作抗蚀剂材料的树脂成分，能有效地感知短波长辐射，对辐射具有高透明度和优异的干蚀刻性能，并在抗蚀剂材料所需的基本抗蚀性能（如高灵敏度、分辨率、显影性等）方面表现优异。