This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
本公开涉及一种清洁组合物,其中包含:1)至少一种氧化还原剂;2)至少一种第一
螯合剂,第一
螯合剂为聚
氨基多
羧酸;3)至少一种不同于第一
螯合剂的第二
螯合剂,第二
螯合剂含有至少两个含氮基团;4) 至少一种
金属缓蚀剂,该
金属缓蚀剂为取代或未取代的苯并三唑; 5) 至少一种有机溶剂,该有机溶剂选自由
水溶性醇、
水溶性酮、
水溶性酯和
水溶性醚组成的组; 6)
水;以及 7) 可选地,至少一种 pH 值调节剂,该 pH 值调节剂为不含
金属离子的碱。本公开还涉及一种使用上述组合物清洗半导体基底的方法。