Formaldehyde;3-methylphenol

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: Formaldehyde;3-methylphenol
• 化学式: C8H10O2
• 分子量: 138.16
• InChiKey: IJQNAZMWWYJWNA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.52
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
  申请人：——

  公开号：US20020128408A1

  公开（公告）日：2002-09-12

  The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

  本发明涉及一种辐射敏感的光阻组合物，包括光酸引发剂和聚环状聚合物，该聚合物包含含有侧链酸敏感基团的重复单元。在暴露于成像辐射源时，光酸引发剂生成酸，该酸会裂解侧链酸敏感基团，从而影响聚合物的极性变化。在成像源暴露的区域，聚合物变得可溶于水性碱。
• PHOTOSENSITIVE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, POLYURETHANE, AND METHOD FOR PRODUCING POLYURETHANE
  申请人：FUJIFILM CORPORATION

  公开号：US20140134540A1

  公开（公告）日：2014-05-15

  A photosensitive composition includes (A) a polyurethane obtained by reacting a diol component including a compound represented by the following Formula (I) with a polyisocyanate component; and (B) a photosensitive component. In Formula (I), A represents a single bond, or a divalent linking group including an atom selected from the group consisting of a carbon atom, a hydrogen atom, and an oxygen atoms; B represents a monovalent organic group; each of R 1 to R 5 independently represents a hydrogen atom or an alkyl group; m represents an integer from 0 to 3; n represents an integer from 0 to 3; and m+n is not zero.

  一种光敏组合物，包括(A)聚氨酯和(B)光敏组分。聚氨酯是通过将包括以下式(I)的化合物的二元醇组分与多异氰酸酯组分反应而获得的。在式(I)中，A表示单键，或者包括从群组中选择的原子的双价连接基团，该群组包括碳原子，氢原子和氧原子；B表示单价有机基团；R1到R5中的每一个独立地表示氢原子或烷基；m表示从0到3的整数；n表示从0到3的整数；且m+n不为零。
• Photoconductive compositions and electrophotographic photoreceptors using the same
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0131140A2

  公开（公告）日：1985-01-16

  Disazo compounds of a specified structure as a photoconductive element for photoreceptors in an electrophotographic process, which achieve higher photo-sensitivity and higher durability compared with conventional organic photoconductive materials, useful with copying machines, printers, video camera pickup tubes and semiconductor circuits for signal transfer and scanning.

  与传统的有机光电导材料相比，具有特定结构的 Disazo 化合物具有更高的光敏性和耐久性，可用于复印机、打印机、摄像机拾取管以及用于信号传输和扫描的半导体电路。
• A process for rendering a polymeric material resistant to an oxygen-containing plasma
  申请人：International Business Machines Corporation

  公开号：EP0198215A2

  公开（公告）日：1986-10-22

  Polymeric material containing reactive hydrogen functional groups is rendered resistant to an oxygen-containing plasma by reacting the polymeric material with a multifunctional organometallic material such as hexamethylcyclotrisilazane containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material.

  将含有活性氢官能团的聚合材料与多功能有机金属材料（如六甲基环三硅氮烷）反应，可使聚合材料耐受含氧等离子体的腐蚀，这种多功能有机金属材料至少含有两个官能团，可与聚合材料的活性氢官能团发生反应。
• Removal of residual catalyst from a dielectric substrate
  申请人：International Business Machines Corporation

  公开号：EP0291786A2

  公开（公告）日：1988-11-23

  Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.

  将电介质基板暴露在由惰性气体形成的等离子体中，可去除基板上的残留催化剂。