Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethane-phosphonic Acid
作者:Amir H. Mahmoudkhani、Vratislav Langer、Oliver Lindqvist
DOI:10.1080/713744570
日期:2003.10.1
Organosilicon-phosphonate compounds with the general formula (R)(n)(RO)(3)-Si-n(CH2)(m)P(O)(OSiR'(3))(2) are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P-)O-H...O-P hydrogen bonds.
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