N2,N2,N4,N4-Tetrakis(methoxymethyl)-6-methyl-1,3,5-triazine-2,4-diamine | 143228-87-9

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N2,N2,N4,N4-Tetrakis(methoxymethyl)-6-methyl-1,3,5-triazine-2,4-diamine
• 英文别名: 2-N,2-N,4-N,4-N-tetrakis(methoxymethyl)-6-methyl-1,3,5-triazine-2,4-diamine
• CAS: 143228-87-9
• 化学式: C₁₂H₂₃N₅O₄
• 分子量: 301.34
• InChiKey: SDFODLXQWXFUKX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  21
• 可旋转键数：
  10
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  82.1
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• PHOTOSENSITIVE RESIN COMPOSITIONS
  申请人：Fujifilm Electronic Materials USA, Inc.

  公开号：EP1609024B1

  公开（公告）日：2015-09-30
• BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS
  申请人：Liu Weihong

  公开号：US20110250544A1

  公开（公告）日：2011-10-13

  Antireflective coating compositions are discussed.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK
  申请人：FUJIFILM Corporation

  公开号：US20150086911A1

  公开（公告）日：2015-03-26

  An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y 1 and Y 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)