COMPOUND, STARTING MATERIAL FOR THIN FILM FORMATION, THIN FILM PRODUCTION METHOD, AND AMIDINE COMPOUND
申请人:Adeka Corporation
公开号:EP3539973A1
公开(公告)日:2019-09-18
A raw material for forming a thin film, comprising a compound represented by General Formula (1) below.
(in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.)
一种用于形成薄膜的原材料,由以下通式(1)表示的化合物组成。
(式中,R1 代表具有 1 至 5 个碳原子的直链或支链烷基,R2 代表氢或具有 1 至 5 个碳原子的直链或支链烷基,R3 和 R4 各自独立地代表具有 1 至 5 个碳原子的直链或支链烷基,A 代表具有 1 至 4 个碳原子的烷二基,M 代表铜、铁、镍、钴或锰)。