2-cyclohexyl-1,3-diisopropylguanidine

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 2-cyclohexyl-1,3-diisopropylguanidine
• 英文别名: 2-cyclohexyl-1,3-di(propan-2-yl)guanidine
• 化学式: C₁₃H₂₇N₃
• 分子量: 225.377
• InChiKey: USRSBUXIFGHZEX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  36.4
• 氢给体数：
  2
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  对称二异丙基脲 、 环己胺 在 草酰氯 作用下， 生成 2-cyclohexyl-1,3-diisopropylguanidine
  参考文献：
  名称：

  在均相或非均相条件下由二氧化碳和丙-2-炔-1-胺形成恶唑烷-2-酮环的超强碱催化

  摘要：

  N-烷基取代的丙-2-炔-1-胺和N-三，四和五烷基取代的胍或其他强有机碱在二氧化碳的作用下组装，以提供氨基甲酸酯，由氨基甲酸酯生成亚甲基恶唑烷酮2由闭环形成。如果胍中存在适当长度的烷基或环烷基链，则该反应在非溶剂条件下容易在非均相条件下发生。

  DOI：

  10.1039/a800453f

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。
• Organoaluminum Catalyzed Guanylation and Hydroboration Reactions of Carbodiimides
  作者：Deepak Kumar Nayak、Nabin Sarkar、Chabathula Manoj Sampath、Rajata Kumar Sahoo、Sharanappa Nembenna

  DOI：10.1002/zaac.202200116

  日期：2022.10.14

  Herein, we report the guanylation of carbodiimides with primary and secondary alkyl/aryl amines and the reduction of CDIs via hydroboration using molecular conjugated bis-guanidinate (CBG) aluminum alkyl catalysts. The first example of structurally characterized unsymmetrical tetra-aryl substituted CBG (LH) is reported. The reaction of LH; (L=(Ar1NH)(ArN)−C=N−C=(NAr)(NHAr1)}; Ar1=2,6-iPr2−C6H3, Ar=2

  在此，我们报告了碳二亚胺与伯和仲烷基/芳基胺的鸟苷化作用，以及使用分子共轭双胍 (CBG) 烷基铝催化剂通过硼氢化还原 CDI。报道了结构表征的不对称四芳基取代的CBG（LH）的第一个例子。LH的反应；(L=(Ar 1 NH)(ArN)-C=N-C=(NAr)(NHAr 1 )}；Ar 1 =2,6- i Pr 2 -C 6 H 3 ,Ar=2,6- Me 2 -C 6 H 3 ) 与 AlMe 3溶液提供了 LAlMe 2 ( 1） 复杂的。对配体 (LH) 和化合物1进行了彻底的表征，包括单晶 X 射线衍射研究。更重要的是，化合物1和 L'AlMe 2 ( 2 )；(L'=(ArNH)(ArN)-C=N-C=(NAr)(NHAr)}；Ar=2,6-Et 2 -C 6 H 3 )用作NH和B的催化剂-H 与对称芳基或烷基碳二亚胺加成，以优异的收率获得相应的胍和 N-硼基甲脒。所开发的
• Rapid-curing, migration-free composition based on organic polymers containing silane groups
  申请人：SIKA TECHNOLOGY AG

  公开号：US10100069B2

  公开（公告）日：2018-10-16

  The invention relates to a composition comprising at least one organic polymer that contains silane groups and at least one catalyst of formula (I). The composition is low in emissions and low-odor, has a good shelf-life, cures rapidly to form a mechanically high-quality, durable material with a very low propensity for migration-related defects such as exudation or dirt retention by the substrate. The composition is particularly suitable for use as an adhesive, sealant or coating.

  本发明涉及一种由至少一种含有硅烷基团的有机聚合物和至少一种式（I）催化剂组成的组合物。该组合物排放量低、气味小、保质期长、固化速度快，可形成一种机械质量高、经久耐用的材料，且与迁移相关的缺陷（如基材渗出或污垢滞留）发生的倾向性极低。该组合物特别适合用作粘合剂、密封剂或涂料。
• Titanacarborane mediated C–N bond forming/breaking reactions
  作者：Hao Shen、Zuowei Xie

  DOI：10.1016/j.jorganchem.2008.11.010

  日期：2009.5

  Constrained-geometry titanacarboranes [sigma: eta(1):eta(5)-(OCH2)(R2NCH2)C2B9H9]Ti(NR2) (R = Me, Et) are synthesized via an unexpected reaction of [Me3NH][mu-7,8-CH2OCH2-7,8-C2B9H10] with Ti(NR2)(4) (R = Me, Et), involving a C-O bond cleavage and C-N bond formation. These complexes can be readily converted to new amide species or alkoxide by reacting with amines or esters, respectively. Insertion of a series of unsaturated molecules into the Ti-N bond of the aforementioned complexes results in the formation of various half-sandwich titanacarboranes. [sigma: eta(1): eta(5)-(OCH2)(Me2NCH2)C2B9H9]Ti(NMe2) is also able to efficiently catalyze the hydroamination of carbodiimides and the transamination of guanidines. These results are summarized in this brief account. (C) 2008 Elsevier B.V. All rights reserved.