3-noradamantyl chloride

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氯化物
• 英文名称: 3-noradamantyl chloride
• 英文别名: 3-(Chloromethyl)tricyclo[3.3.1.03,7]nonane；3-(chloromethyl)tricyclo[3.3.1.03,7]nonane
• 化学式: C₁₀H₁₅Cl
• 分子量: 170.682
• InChiKey: ZRRMKFXONJMCRY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  3-羟甲基降金刚烷 在 四氯化碳 、 草酰氯 、 thiopyridine N-oxide sodium salt 作用下， 生成 3-noradamantyl chloride
  参考文献：
  名称：

  Radical Rearrangements for the Chemical Vapor Deposition of Diamond

  摘要：

  A combination of chemical trapping and computations is used to determine the activation parameters far the interconversion of the 3-methylenebicyclo[3.3.1]nonan-7-yl (1), (3-noradamantyl)methyl (2), and 1-adamantyl (3) radicals. The three radicals model proposed intermediate surface radical structures in the chemical vapor deposition (CVD) of diamond on its 2 x 1 reconstructed [100] surface. The study finds that relatively low-level calculations previously applied to the problem of diamond growth are reliable, at least qualitatively.

  DOI：

  10.1021/jo971814+

文献信息

• The Carbene Fragmentation−Ring Expansion Route to Bridgehead Carbocations
  作者：Robert A. Moss、Fengmei Zheng、Jean-Marie Fedé、Ronald R. Sauers

  DOI：10.1021/ol020083j

  日期：2002.7.1

  [GRAPHICS]The products, kinetics, and activation parameters were determined for the fragmentation-ring expansions of 1-norbornylmethyloxychlorocarbene (11) and 3-noradamantylmethyloxychlorocarbene (17). Products from 11 (in dichloroethane) included 1-chlorobicyclo[2.2.2]octane (9, 56%) and 1-chlorobicyclo[3.2.1]octane (10, 37%); from 17, we obtained I-chloroadamantane (15, 68%) and protoadamantyl chloride (16, 28%).
• Radical Rearrangements for the Chemical Vapor Deposition of Diamond
  作者：Andreas M. Mueller、Peter Chen

  DOI：10.1021/jo971814+

  日期：1998.7.1

  A combination of chemical trapping and computations is used to determine the activation parameters far the interconversion of the 3-methylenebicyclo[3.3.1]nonan-7-yl (1), (3-noradamantyl)methyl (2), and 1-adamantyl (3) radicals. The three radicals model proposed intermediate surface radical structures in the chemical vapor deposition (CVD) of diamond on its 2 x 1 reconstructed [100] surface. The study finds that relatively low-level calculations previously applied to the problem of diamond growth are reliable, at least qualitatively.