A silicon layer etchant composition and associated methods, the composition including about 1 wt % to about 20 wt % of an alkylammonium hydroxide; about 1 wt % to about 30 wt % of an amine compound; about 0.01 wt % to about 0.2 wt % of a nonionic surfactant including both a hydrophobic group and a hydrophilic group; and water, all wt % being based on a total weight of the silicon layer etchant composition.
一种
硅层蚀刻剂组合物及相关方法,该组合物包括约 1 重量份至约 20 重量份的烷基氢氧化
铵;约 1 重量份至约 30 重量份的胺化合物;约 0.01 重量份至约 0.2 重量份的非离子表面活性剂(包括疏
水基团和亲
水基团);以及
水,所有重量份均基于
硅层蚀刻剂组合物的总重量。