Fluorinated monomer having cyclic structure, manufaturing method, polymer, photoresist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP2075247A1
公开(公告)日:2009-07-01
Fluorinated monomers having a cyclic structure represented by the general formula (3) or (4):
wherein R5, R6, R7, R8, R9, R10, R11, R12, R13, and R14 are each independently selected from among hydrogen, hydroxyl, halogen, and straight, branched or cyclic monovalent organic group of 1 to 15 carbon atoms, at least one of R5, R6, R7, R8, R9, and R10 and at least one of R11, R12, R13 and R14 is a monovalent organic group containing a polymerizable unsaturated group, a combination of any, at least two of R5, R6, R7, R8, R9, and R10 and a combination of any, at least two of R11, R12, R13 and R14 may bond together to form a ring with the carbon atom or atoms to which they are attached, the ring contains a polymerizable unsaturated group unless the remaining group or groups which do not relate to the ring formation contain a polymerizable unsaturated group, are useful to produce polymers for the manufacture of radiation-sensitive resist compositions which are fully transparent to radiation having a wavelength of up to 300 nm and have improved development properties.
具有通式 (3) 或 (4) 所代表的环状结构的含氟单体:
其中 R5、R6、R7、R8、R9、R10、R11、R12、R13 和 R14 各自独立地选自氢、羟基、卤素和 1 至 15 个碳原子的直链、支链或环状一价有机基团,R5、R6、R7、R8、R9 和 R10 中的至少一个以及 R11、R12、R13 和 R14 中的至少一个是含有 1 至 15 个碳原子的一价有机基团、和 R10 中的至少一个,以及 R11、R12、R13 和 R14 中的至少一个是含有可聚合不饱和基团的一价有机基团,R5、R6、R7、R8、R9 和 R10 中的至少两个的任意组合,以及 R11、R12、R13 和 R14 中的至少两个的任意组合、R13 和 R14 可键合在一起,与它们所连接的碳原子形成环,该环含有可聚合的不饱和基团,除非与形成环无关的其余一个或多个基团含有可聚合的不饱和基团。