Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US11130724B2
公开(公告)日:2021-09-28
The present invention employs a compound represented by the following formula (0):
wherein RY is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms;
RZ is an N-valent group of 1 to 60 carbon atoms or a single bond;
each RT is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one RT is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group;
X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9;
N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and
each r is independently an integer of 0 to 2.
本发明采用了下式 (0) 所代表的化合物:
其中 RY 是 1 至 30 个碳原子的直链、支链或环状烷基或 6 至 30 个碳原子的芳基;
RZ 是 1 至 60 个碳原子的 N 价基团或单键;
每个 RT 独立地是 1 至 30 个碳原子的烷基,可选择具有取代基;6 至 40 个碳原子的芳基,可选择具有取代基;2 至 30 个碳原子的烯基,可选择具有取代基;1 至 30 个碳原子的烷氧基,可选择具有取代基;卤素原子;硝基;氨基;氰基;硫醇基、羟基或羟基的氢原子被酸离解基团取代的基团,其中烷基、烯基和芳基各自可选含有醚键、酮键或酯键,其中至少一个 RT 是羟基或羟基的氢原子被酸离解基团取代的基团;
X 是氧原子、硫原子或不是交联剂;每个 m 独立地为 0 至 9 的整数,其中至少一个 m 为 1 至 9 的整数;
N 是 1 至 4 的整数,其中当 N 是 2 或更大的整数时,括号[ ]内的 N 结构式相同或不同;以及
每个 r 独立地为 0 至 2 的整数。