8-N'-monotrifluoromethanesulfonamidonaphthalene

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 8-N'-monotrifluoromethanesulfonamidonaphthalene
• 英文别名: 1,1,1-trifluoro-N-naphthalen-1-ylmethanesulfonamide
• 化学式: C₁₁H₈F₃NO₂S
• 分子量: 275.251
• InChiKey: LRVDJULRTAOFJT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  54.6
• 氢给体数：
  1
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  2-(trimethylsilyl)-1,3-phenylene bis(trifluoromethanesulfonate) 、 8-N'-monotrifluoromethanesulfonamidonaphthalene 在 18-冠醚-6 、 potassium carbonate 作用下， 以 甲苯 为溶剂， 反应 10.5h， 以70%的产率得到
  参考文献：
  名称：

  Diamination of Domino Aryne Precursor with Sulfonamides

  摘要：

  The reaction of a domino aryne precursor with sulfonamides efficiently afforded both 1,3-diaminobenzenes and trisubstituted 1,3-diaminobenzenes by simply varying the reaction conditions. Mechanistic study supports the sequential formation of two transient aryne intermediates involved in-the reaction.

  DOI：

  10.1021/acs.orglett.6b01334
• 作为产物：
  描述：

  1-萘胺 、 2-[N,N-双(三氟甲烷烷磺酰)氨基]吡啶 以 乙腈 为溶剂， 以92%的产率得到8-N'-monotrifluoromethanesulfonamidonaphthalene
  参考文献：
  名称：

  一种N`-三氟甲磺酰基N杂芳香胺类化合物及其制备方法

  摘要：

  本发明公开了一种N'‑三氟甲磺酰基N杂芳香胺类化合物及其制备方法，包括以下步骤：在惰性气体保护下，以N杂芳香基氨为原料，在无水非质子溶剂中，与2‑[N,N‑双(三氟甲烷烷磺酰)氨基]吡啶进行反应，高产率得到N'‑三氟甲磺酰基N杂芳香胺类化合物。本发明提供的制备方法具有工艺简单，底物选择广泛，产率高的特点。本发明所提供的技术工艺简单，底物选择广泛，后处理纯化方式简便有效，可高效、高产率、高纯度的得到N'‑三氟甲磺酰基N杂芳香胺类化合物。

  公开号：

  CN111606846A

文献信息

• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS
  申请人：CHEN KUANG-JUNG

  公开号：US20130040238A1

  公开（公告）日：2013-02-14

  A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions.

  一种负可展性底部防反射涂层（NDBARC）材料，包括含有脂肪族醇基团、芳香基团和羧酸基团的聚合物。NDBARC组合物在涂覆和烘烤后，不溶于典型的抗蚀剂溶剂，如丙二醇甲醚乙酸酯（PGMEA）。NDBARC材料还包括光酸发生剂，以及可选的交联化合物。在NDBARC材料中，羧酸提供了开发剂的溶解性，而仅有醇，仅有羧酸或它们的组合提供了对PGMEA的抗性。NDBARC材料具有抗抗蚀剂溶剂的性能，因此，在涂覆NDBARC时，NDBARC和抗蚀剂之间不会发生混合。经过曝光和烘烤后，负光刻胶和NDBARC层的光刻曝光部分由于聚合物的化学增强交联而变得不溶于开发剂。
• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF
  申请人：International Business Machines Corporation

  公开号：US20150050601A1

  公开（公告）日：2015-02-19

  The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

  本发明涉及一种可开发的底部抗反射涂层（BARC）组合物及使用该BARC组合物的图案形成方法。该BARC组合物包括第一聚合物，其具有第一羧基酸基团，含羟基的脂环族基团和第一色团基团；第二聚合物，其具有第二羧基酸基团，含羟基的非环族基团和第二色团基团；交联剂；以及辐射敏感的酸发生剂。第一和第二色团基团吸收100纳米至400纳米波长的光线。在图案形成方法中，先形成一层BARC组合物的BARC层，再在其上形成一层光阻层。经曝光后，通过显影剂选择性地去除光阻层和BARC层的未曝光区域，形成光阻层中的图案结构。该BARC组合物和图案形成方法特别适用于植入级别。
• Helichromic compounds and displays
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0044666A2

  公开（公告）日：1982-01-27

  A composition for use with liquid crystal compositions in liquid crystal display devices, which possesses both a chromophoric moiety and a helical ordering moiety. The helical ordering moiety is capable of helically ordering a mixture of liquid crystal material and helichromic compound. The helichromic compound can be utilized in conventional "guest-host" and "twist nematic" displays as well as in unique helichromic displays. When used in helichromic displays, the helichromic compounds eliminate after-image scattering and enable the display to be operated at reduced voltages.

  一种用于液晶显示设备中液晶成分的组合物，它同时具有发色团分子和螺旋排序分子。螺旋有序分子能够使液晶材料和螺旋铬化合物的混合物螺旋有序。该斜向铬化合物可用于传统的 "客主 "和 "扭曲向列 "显示屏，也可用于独特的斜向铬显示屏。当螺旋基质化合物用于螺旋基质显示屏时，可消除残像散射，并使显示屏在较低的电压下工作。
• LUBRICANT COMPOSITION
  申请人：Idemitsu Kosan Co., Ltd.

  公开号：EP2444474A1

  公开（公告）日：2012-04-25

  A lubricant oil composition which is excellent in wear resistance, high temperature detergency and base number retaining property, despite its low phosphorus content, low sulfur content and low sulfuric acid ash content, is provided at a low cost by compounding a sulfonamide compound having a specific structure in a base oil.

  通过在基础油中复合具有特定结构的磺酰胺化合物，以低成本提供了一种尽管磷含量低、硫含量低和硫酸灰分含量低，但却具有优异的耐磨性、高温清净性和基数保持性能的润滑油组合物。
• Helichromic-smectic liquid crystal compositions and display cells
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0107492B1

  公开（公告）日：1989-08-09