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N-(trifluoromethylsulfonyloxy)diphenylmaleimide

中文名称
——
中文别名
——
英文名称
N-(trifluoromethylsulfonyloxy)diphenylmaleimide
英文别名
N-(trifluoromethanesulfonyloxy)diphenylmaleimide;1-(Trifluoromethylsulfonyloxy)-3,4-diphenyl-3-pyrroline-2,5-dione;(2,5-dioxo-3,4-diphenylpyrrol-1-yl) trifluoromethanesulfonate
N-(trifluoromethylsulfonyloxy)diphenylmaleimide化学式
CAS
——
化学式
C17H10F3NO5S
mdl
——
分子量
397.331
InChiKey
RLLFCCPTQOZGOL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.6
  • 重原子数:
    27
  • 可旋转键数:
    4
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.06
  • 拓扑面积:
    89.1
  • 氢给体数:
    0
  • 氢受体数:
    8

反应信息

  • 作为反应物:
    描述:
    N-(trifluoromethylsulfonyloxy)diphenylmaleimideα-苯乙胺potassium carbonate 作用下, 以 N,N-二甲基甲酰胺 为溶剂, 反应 4.0h, 以16%的产率得到3-(1-phenylethyl)-5,6-diphenylpyrimidine-2,4-(1H,3H)-dione
    参考文献:
    名称:
    Facile Synthesis of 3-N-Alkyl Pyrimidin-2,4-diones from N-Sulfonyloxy Maleimides and Amines
    摘要:
    Reaction of variously substituted N-trifluoromethanesulfonyloxy maleimides with primary amines in the presence of potassium carbonate in DMF at room temperature results in the formation of 3-N-alkyl pyrimidin-2,4-diones in good yield.
    DOI:
    10.1021/acs.orglett.5b02079
  • 作为产物:
    描述:
    参考文献:
    名称:
    Facile Synthesis of 3-N-Alkyl Pyrimidin-2,4-diones from N-Sulfonyloxy Maleimides and Amines
    摘要:
    Reaction of variously substituted N-trifluoromethanesulfonyloxy maleimides with primary amines in the presence of potassium carbonate in DMF at room temperature results in the formation of 3-N-alkyl pyrimidin-2,4-diones in good yield.
    DOI:
    10.1021/acs.orglett.5b02079
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文献信息

  • RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20160145231A1
    公开(公告)日:2016-05-26
    A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    描述了一种包含由通式(1)或(2)表示的化合物的光刻胶组合物,使用该组合物形成光刻胶图案的方法,用于该组合物的多化合物,以及可以由其衍生的醇化合物。
  • OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20200262787A1
    公开(公告)日:2020-08-20
    The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.
    本发明提供了一种包括含化合物或含树脂的光学元件成型组合物。
  • [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
    申请人:BASF SE
    公开号:WO2016124493A1
    公开(公告)日:2016-08-11
    Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
    化合物的化学式(I)和(IA),其中X为-O(CO)-;R1为C1-C12卤代烷基或C6-C10卤代芳基;R2位于香豆素环的第7位,为OR8;R2a、R2b和R2C彼此独立地为氢;R3为C1-C8卤代烷基或C1-C8卤代烷基;R4为氢;R8为C1-C6烷基,适用于作为感光酸给体,用于制备光刻胶组合物,例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器(LCD)的制备。
  • METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP
    申请人:Kyowa Hakko Chemical Co., Ltd.
    公开号:EP1661918A1
    公开(公告)日:2006-05-31
    The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O-C-C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).
    本发明提供了一种生产具有由通式(II)表示的基团的化合物的方法:(其中R1、R2和R3可以相同也可以不同,并且分别表示取代或未取代的烷基、取代或未取代的芳基、或取代或未取代的芳基烷基,或者R1和R2可以相互结合形成与相邻碳原子一起的脂环碳氢环,或者R2和R3可以相互结合形成与相邻的O-C-C一起具有取代基的脂环杂环)的方法,该方法包括允许具有羟基的化合物与由通式(I)表示的卤代烷基醚发生反应:(其中R1、R2和R3分别与上述定义相同,X代表卤素原子)。
  • Polymer and photoresist compositions
    申请人:Shipley Company, L.L.C.
    公开号:US20020173680A1
    公开(公告)日:2002-11-21
    Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
    本文披露了螺环烯烃聚合物、制备螺环烯烃聚合物的方法、包括螺环烯烃树脂粘合剂的光刻胶组合物,以及利用这种光刻胶组合物形成凸版图像的方法。
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