diphenyl(5,7-diethylthioxanthene-9-one-2-yl)sulfonium trifluoromethanesulfonate

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 硫色烯
• 英文名称: diphenyl(5,7-diethylthioxanthene-9-one-2-yl)sulfonium trifluoromethanesulfonate
• 英文别名: (5,7-diethyl-9-oxothioxanthen-2-yl)-diphenylsulfanium;trifluoromethanesulfonate
• 化学式: CF₃O₃S*C₂₉H₂₅OS₂
• 分子量: 602.719
• InChiKey: GPAZIOPJIABMCV-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.69
• 重原子数：
  40
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  109
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  2,4-二乙基噻唑酮 、 三氟甲磺酸酐 、 二苯基亚砜 在 水 、 crude product 作用下， 以 二氯甲烷 为溶剂， 反应 4.0h， 以to obtain 38.6 g of objective substance as yellow glassy substance (yield: 64%)的产率得到diphenyl(5,7-diethylthioxanthene-9-one-2-yl)sulfonium trifluoromethanesulfonate
  参考文献：
  名称：

  Heterocycle-bearing onium salts

  摘要：

  本发明涉及一种含杂环离子盐，例如，用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂，并提供“一种由通式[1]所示的含杂环离子盐：[其中R是由通式[2]所示的基团：（其中R3和R4分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X2是氧原子或硫原子；i是0到4的整数；j是0到3的整数），或由通式[3]所示的基团：（其中R5和R6分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X3和X4分别独立地是氧原子或硫原子；p是0到2的整数；q是0到3的整数）；R1和R2分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；m和n分别独立地是0到5的整数；A是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子：HM1（R7）4[4]（其中M1是硼原子或镓原子；R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团）]”或“一种由通式[35]所示的含杂环离子盐：[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团，上述通式[2]所示的基团或上述通式[3]所示的基团；A3是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子；并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团，当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时，A3是从通式[36]所示的无机强酸得到的阴离子：HM3F6[36]（其中M3是磷原子、砷原子或锑原子），有机酸或由通式[4]所示的化合物]”。

  公开号：

  US20050233253A1

文献信息

• A heterocycle-containing onium salt
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1953149A2

  公开（公告）日：2008-08-06

  The present invention relates to a heterocycle-containing iodonium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, shown by the general formula [35]: [wherein R26 and R27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2]: or a group shown by the general formula [3]: A3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]:         HM1(R7)4     [4] (wherein M1 is a boron atom or a gallium atom; and R7 is an aryl group); and provided that at least one of R26 and R27. is a group shown by the above-mentioned general formula [2] or [3], and when only one of R26 and R27 is a group shown by the above-mentioned general formula [2] or [3], A3 is an anion derived from an inorganic strong acid shown by the general formula [36];         HM3F6     [36] (wherein M3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4])]

  本发明涉及一种含杂环的碘盐，可用作阳离子光聚合引发剂和化学放大抗蚀剂的酸发生剂等，其通式为[35]： [其中 R26 和 R27 各自独立地为芳基，该芳基可以有一个卤素原子或一个低级烷基作为取代基，该基团如上述通式[2]所示： 或通式[3]所示的基团： A3 是一个卤素原子或一个来自无机强酸、有机酸或通式[4]所示化合物的阴离子： HM1(R7)4 [4]. (其中M1是硼原子或镓原子；R7是芳基)；并且R26和R27中至少有一个是上述通式[2]或[3]所示的基团，当R26和R27中只有一个是上述通式[2]或[3]所示的基团时，A3是衍生自通式[36]所示的无机强酸的阴离子； HM3F6 [36］ (其中 M3 是磷原子、砷原子或锑原子）、有机酸或通式[4]所示的化合物）]。
• HETEROCYCLE-BEARING ONIUM SALTS
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1481973B1

  公开（公告）日：2008-12-31
• US7318991B2
  申请人：——

  公开号：US7318991B2

  公开（公告）日：2008-01-15
• US7833691B2
  申请人：——

  公开号：US7833691B2

  公开（公告）日：2010-11-16
• Heterocycle-bearing onium salts
  申请人：Ishihara Masami

  公开号：US20050233253A1

  公开（公告）日：2005-10-20

  The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]: [wherein R is a group shown by the general formula [2]: (wherein R 3 and R 4 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 2 is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]: (wherein R 5 and R 6 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 3 and X 4 are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R 1 and R 2 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]: HM 1 (R 7 ) 4 [4] (wherein M 1 is a boron atom or a gallium atom; and R 7 is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]: [wherein R 26 and R 27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A 3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], and when only one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], A 3 is an anion derived from an inorganic strong acid shown by the general formula [36]; HM 3 F 6 [36] (wherein M 3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.

  本发明涉及一种含杂环离子盐，例如，用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂，并提供“一种由通式[1]所示的含杂环离子盐：[其中R是由通式[2]所示的基团：（其中R3和R4分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X2是氧原子或硫原子；i是0到4的整数；j是0到3的整数），或由通式[3]所示的基团：（其中R5和R6分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X3和X4分别独立地是氧原子或硫原子；p是0到2的整数；q是0到3的整数）；R1和R2分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；m和n分别独立地是0到5的整数；A是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子：HM1（R7）4[4]（其中M1是硼原子或镓原子；R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团）]”或“一种由通式[35]所示的含杂环离子盐：[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团，上述通式[2]所示的基团或上述通式[3]所示的基团；A3是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子；并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团，当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时，A3是从通式[36]所示的无机强酸得到的阴离子：HM3F6[36]（其中M3是磷原子、砷原子或锑原子），有机酸或由通式[4]所示的化合物]”。