PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
申请人:Hitachi Chemical Company, Ltd.
公开号:EP2135910A1
公开(公告)日:2009-12-23
The photosensitive adhesive composition of the invention comprises (A) an alkali-soluble resin, (B) an epoxy resin, (C) a radiation-polymerizable compound and (D) a photoinitiator, wherein the (D) photoinitiator contains at least (D1) a photoinitiator that exhibits a function which promotes polymerization and/or curing reaction of the epoxy resin by exposure to radiation.
本发明的光敏粘合剂组合物包括 (A) 碱溶性树脂、(B) 环氧树脂、(C) 可辐射聚合的化合物和 (D) 光引发剂,其中 (D) 光引发剂至少包含 (D1) 光引发剂,该光引发剂具有通过暴露于辐射促进环氧树脂聚合和/或固化反应的功能。