Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20030036603A1
公开(公告)日:2003-02-20
Epoxy compounds of formula (1) are provided wherein W is CH
2
, O or S, X and Y are —CR
1
R
2
— or —C(═O)—, k is 0 or 1, R
1
and R
2
are H or alkyl, or R
1
and R
2
, taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
1