A base precursor for heat-developable photosensitive material
申请人:FUJI PHOTO FILM CO., LTD.
公开号:EP0123937A1
公开(公告)日:1984-11-07
A base precursor for heat-developable photosensitive material is disclosed. The precursor is comprised of a compound represented by general formula (1) or (II):
The substituents within the genral formulae are dfined within the specification. The use of this novel base precur- sur makes it possible to obtain a material which is very stable at normal temperatures and which smoothly decomposes under heating at 80°C or higher in order to release a basic constituent.
本发明公开了一种用于热显影感光材料的基质前体。该前体由通式 (1) 或 (II) 所代表的化合物组成:
通式中的取代基在说明书中作了规定。使用这种新型基前体可以获得一种在常温下非常稳定的材料,这种材料在 80°C 或更高温度下加热时会顺利分解,从而释放出一种基本成分。