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4,5-dimethyl-2-(hexafluoro-α-hydroxyisopropyl)phenol

中文名称
——
中文别名
——
英文名称
4,5-dimethyl-2-(hexafluoro-α-hydroxyisopropyl)phenol
英文别名
2-(1,1,1,3,3,3-Hexafluoro-2-hydroxypropan-2-yl)-4,5-dimethylphenol
4,5-dimethyl-2-(hexafluoro-α-hydroxyisopropyl)phenol化学式
CAS
——
化学式
C11H10F6O2
mdl
——
分子量
288.19
InChiKey
HGZWGVGCJSJUFK-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4
  • 重原子数:
    19
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.45
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    8

反应信息

  • 作为反应物:
    描述:
    4,5-dimethyl-2-(hexafluoro-α-hydroxyisopropyl)phenol 在 sulfur 、 三乙胺 作用下, 生成 6,7-Dimethyl-2-propoxy-4,4-bis-trifluoromethyl-4H-benzo[1,3,2]dioxaphosphinine 2-sulfide
    参考文献:
    名称:
    New 4,4-bis(trifluoromethyl)-4H-1,3,2-benzodioxaphosphinine 2-oxides(sulfides)
    摘要:
    Substituted alpha,alpha-bis(trifluoromethyl)salicylic alcohols react with dichlorido(thio)phosphates in the presence of NEt3 to afford 2-alkoxy-4,4-bis(trifluoromethyl)-4H-1,3,2-benzo-dioxaphosphinine 2-oxide(sulfides) in high yields. The latter can be of interest as potential cholinesterase inhibitors.
    DOI:
    10.1016/j.mencom.2019.01.030
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文献信息

  • Fluorinated Dicarboxylic Acid Derivative and Polymer Obtained Therefrom
    申请人:Isono Yoshimi
    公开号:US20110301305A1
    公开(公告)日:2011-12-08
    According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. [Chem. 134] AOCF 2 C-Q-CF 2 COA′  (M-1) In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A′ each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.
    根据本发明,通过将通式(M-1)的含氟二羧酸衍生物或含氟二羧酸酸酐与具有与含氟二羧酸衍生物或酸酐的羰基部分相对应的两到四个反应性基团的多官能化合物进行聚合缩合反应,可以得到一种聚合物。[Chem. 134]AOCF2C-Q-CF2COA′  (M-1)在上述公式中,Q代表具有取代或未取代芳香环的二价有机基团; A和A'各自独立地表示有机基团。该聚合物表现出足够低的介电常数,可用作半导体保护膜,并具有在相对较低的温度下(250℃或更低)形成膜的能力。
  • Nifant'ev, E. E.; Kukhareva, T. S.; Dyachenko, V. I., Russian Journal of General Chemistry, 1993, vol. 63, # 3.2, p. 498 - 499
    作者:Nifant'ev, E. E.、Kukhareva, T. S.、Dyachenko, V. I.、Kolomiets, A. F.
    DOI:——
    日期:——
  • Novolak Resin Containing Hexafluoroisopropanol Group, Method for Producing Same, and Composition of Same
    申请人:CENTRAL GLASS COMPANY, LIMITED
    公开号:US20150337077A1
    公开(公告)日:2015-11-26
    Disclosed is a novolak resin containing a repeating unit represented by the general formula (1). R 1 is a hydrogen atom or an alkyl group which is C 1-4 straight-chain or C 3-4 branched-chain, and some or all hydrogen atoms in the alkyl group may be replaced with a fluorine atom; R 2 is a hydrogen atom, a phenyl group, an alkyl group which is C 1-10 straight-chain or C 3-10 branched-chain, or an alkyl group having a C 3-10 cyclic structure, and some or all hydrogen atoms in the phenyl group and the alkyl group may be replaced with fluorine atoms; each of a and b is independently an integer of 1-3, and these are defined as 2≦a+b≦4; and d is an integer of 0-2. This novolak resin has high dissolution rate in the alkaline development solution in addition to the heat resisting property which is a property of phenolic resin.
  • US8809451B2
    申请人:——
    公开号:US8809451B2
    公开(公告)日:2014-08-19
  • US9464163B2
    申请人:——
    公开号:US9464163B2
    公开(公告)日:2016-10-11
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