(4-amino-[1]naphthyl)-phosphonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: (4-amino-[1]naphthyl)-phosphonic acid
• 英文别名: (4-Amino-[1]naphthyl)-phosphonsaeure；4-amino-1-naphthyl phosphonic acid；(4-Aminonaphthalen-1-yl)phosphonic acid
• 化学式: C₁₀H₁₀NO₃P
• 分子量: 223.168
• InChiKey: NAVURXVJINAYAV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  15
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  83.6
• 氢给体数：
  3
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  二(重氮基)对二氨基联苯 、 (4-amino-[1]naphthyl)-phosphonic acid 生成 4,4'-Bis-(1-amino-4-phosphono-[2]naphthylazo)-biphenyl
  参考文献：
  名称：

  The Indicator and Dye Properties of Some Aromatic Phosphonic Acids and their Arsenic Analogs

  摘要：

  DOI：

  10.1021/ja01115a518
• 作为产物：
  描述：

  1-氨基-4-硝基萘 在 sodium hydroxide 、 iron hydroxide 、 三溴化磷 、 copper(l) chloride 作用下， 生成 (4-amino-[1]naphthyl)-phosphonic acid
  参考文献：
  名称：

  The Indicator and Dye Properties of Some Aromatic Phosphonic Acids and their Arsenic Analogs

  摘要：

  DOI：

  10.1021/ja01115a518

文献信息

• Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate
  申请人：FUJIMI INCORPORATED

  公开号：US10876082B2

  公开（公告）日：2020-12-29

  A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.

  根据本发明，一种表面处理组合物是一种 pH 值低于 7 的表面处理组合物，用于处理具有含钨层的待抛光物体的表面，该表面处理组合物含有钨蚀刻抑制剂和水，其中钨蚀刻抑制剂是一种化合物，含有单环或融合多环芳香烃环，该环具有两个或多个取代基，取代基至少含有一个含氮基团和一个阴离子基团。
• SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
  申请人：FUJIMI INCORPORATED

  公开号：US20190085270A1

  公开（公告）日：2019-03-21

  A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.
• US4225491A
  申请人：——

  公开号：US4225491A

  公开（公告）日：1980-09-30
• US4230618A
  申请人：——

  公开号：US4230618A

  公开（公告）日：1980-10-28
• US4472308A
  申请人：——

  公开号：US4472308A

  公开（公告）日：1984-09-18