己烷,1,6-二异氰酸基-2,5-二甲基- | 106310-92-3

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 己烷,1,6-二异氰酸基-2,5-二甲基-
• 英文名称: 1,6-Diisocyanato-2,5-dimethylhexane
• CAS: 106310-92-3
• 化学式: C₁₀H₁₆N₂O₂
• 分子量: 196.25
• InChiKey: HWHSCZHXWXLWPB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  14
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  58.9
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ISOCYANATE PRODUCTION METHOD
  申请人：ASAHI KASEI KABUSHIKI KAISHA

  公开号：US20200115327A1

  公开（公告）日：2020-04-16

  An isocyanate production method according to the present invention is a method in which an isocyanate is produced by subjecting a carbamate to thermal decomposition, and includes: a step of preparing a mixture liquid containing the carbamate, an inactive solvent and a polyisocyanate compound; a step of conducting a thermal decomposition reaction of the carbamate by continuously introducing the mixture liquid into a thermal decomposition reactor; a step of collecting a low-boiling decomposition product by continuously extracting the low-boiling decomposition product in a gaseous state from the reactor, the low-boiling decomposition product having a boiling point lower than the polyisocyanate compound; and a step of collecting a high-boiling component by continuously extracting, from the reactor, a liquid phase component which is not collected in a gaseous state at the step of collecting the low-boiling decomposition product.

  根据本发明的一种异氰酸酯生产方法是一种通过将氨基甲酸酯经受热分解而生产异氰酸酯的方法，包括：准备含有氨基甲酸酯、无活性溶剂和多异氰酸酯化合物的混合液的步骤；通过持续将混合液引入热分解反应器对氨基甲酸酯进行热分解反应的步骤；通过持续从反应器中以气态形式提取低沸点分解产物的步骤，所述低沸点分解产物的沸点低于多异氰酸酯化合物；通过从反应器中持续提取未在收集低沸点分解产物的步骤中以气态形式收集的液相组分的步骤来收集高沸点组分。
• Release sustaining composition and sustained release preparation
  申请人：Hayakawa Kazuhisa

  公开号：US20050147676A1

  公开（公告）日：2005-07-07

  A release sustaining composition comprising a polyalkylene polyol derivative comprising repeating units U-1 derived from a water-soluble polyalkylene polyol and a polyisocyanate and repeating units U-2 derived from a dihydroxy compound and a polyisocyanate in a molar ratio of U-1/U-2 between 0.5/0.5 and 0.99/0.01 and optionally a water-soluble cellulose ether is combined with an active ingredient to make a sustained release preparation.

  一种持续释放组合物，包括由可溶于水的聚烯烃聚醚和聚异氰酸酯衍生的重复单元U-1以及由二羟基化合物和聚异氰酸酯衍生的重复单元U-2，在U-1/U-2的摩尔比在0.5/0.5至0.99/0.01之间，可选地与可溶于水的纤维素醚结合，用于制备持续释放制剂。
• Photocrosslinkable polyurethanes
  申请人：Sailer Bernhard

  公开号：US20060204895A1

  公开（公告）日：2006-09-14

  Linear crosslinkable polyurethanes obtained from (a) at least one diisocyanate having 2 to 30 carbon atoms, (b) at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose carbon chain at least one carboxyl group is covalently bonded, and some or all of said carboxyl groups have been esterified with an olefinically unsaturated C 3 -C 8 alcohol or with the glycidyl ester of an olefinically unsaturated C 3 -C 8 carboxylic acid, and (c) optionally at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose carbon chain at least one carboxyl group is covalently bonded. The polyurethanes are suitable, alone or as a mixture with other reactive components, for thermal and/or photochemical crosslinking in crosslinkable compositions for the production of mouldings, coatings and in particular solder masks.

  该文段描述了由以下成分制备的线性交联聚氨酯：（a）至少含有2到30个碳原子的二异氰酸酯，（b）至少含有2到30个碳原子的脂肪族或环脂族二醇，其碳链上至少有一个羧基共价结合，并且其中一些或全部羧基已经与烯丙基未饱和的C3-C8醇或烯丙基未饱和的C3-C8羧酸的环氧基酯化合物酯化，以及（c）可选地至少含有2到30个碳原子的脂肪族或环脂族二醇，其碳链上至少有一个羧基共价结合。这些聚氨酯可以单独使用或与其他反应性组分混合，用于热交联和/或光交联交联可制备成型、涂层和特别是钎焊面具的交联组合物的生产。
• Photosensitive resin composition for sandblast resist
  申请人：MATSUSHITA ELECTRONICS CORPORATION

  公开号：EP0741332A1

  公开（公告）日：1996-11-06

  A photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photolithographic patterning, comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, which is obtained from a polyether or polyester compound having a hydroxy group at the molecular chain end, a diisocyanate compound and a (meth)acrylate compound having a hydroxy group; (b) an alkali-soluble polymeric compound having an acid value in the range from 50 to 250 mg KOH/g; and (c) a photopolymerization initiator.

  一种光敏树脂组合物，适用于作为抗喷砂材料，用于在光刻图案后对主体表面进行图案化雕刻，该组合物包括(a) 一种分子末端带有(甲基)丙烯酸酯基团的聚氨酯化合物，该化合物由分子链末端带有羟基的聚醚或聚酯化合物、二异氰酸酯化合物和带有羟基的(甲基)丙烯酸酯化合物制成；(b) 一种碱溶性聚合物化合物，其酸值在 50 至 250 毫克 KOH/g 之间；以及 (c) 一种光聚合引发剂。
• Photosensitive resin composition and photosensitive resin laminated film containing the same
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP0770923A1

  公开（公告）日：1997-05-02

  A photosensitive resin composition comprising the following components (A), (B) and (C): (A) a photopolymerizable urethane (meth)acrylate compound containing at least two acryloyl or methacryloyl groups, (B) an alkali-soluble polymer compound having an acid value of from 50 to 250 mgKOH/g, and (C) a photopolymerization initiator, wherein the photosensitive resin composition has an electrical insulation resistance of 8.0×109 to 1.0×1014 Ω·cm after photocuring. A photosensitive resin laminated film comprising a flexible film, a photosensitive layer provided on the flexible film, and a releasable film layer provided on the photosensitive layer, wherein the photosensitive layer comprises the above photosensitive resin composition.

  一种光敏树脂组合物，包括下列组分(A)、(B)和(C)：(A)可光聚合的氨基甲酸酯(甲基)丙烯酸酯化合物，其中至少含有两个丙烯酰基或甲基丙烯酰基；(B)碱溶性聚合物化合物，其酸值为50至250mgKOH/g；(C)光聚合引发剂，其中光敏树脂组合物在光固化后的绝缘电阻为8.0×109至1.0×1014Ω-cm。一种光敏树脂层压薄膜，包括柔性薄膜、设置在柔性薄膜上的光敏层和设置在光敏层上的可释放薄膜层，其中光敏层包括上述光敏树脂组合物。