(全氟环己基)甲基丙烯酸酯 | 40677-94-9

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 中文名称: (全氟环己基)甲基丙烯酸酯
• 中文别名: 全氟环己基丙烯酸甲酯
• 英文名称: Perfluorocyclohexylmethyl acrylate
• 英文别名: (1,2,2,3,3,4,4,5,5,6,6-undecafluorocyclohexyl)methyl prop-2-enoate
• CAS: 40677-94-9
• 化学式: C₁₀H₅F₁₁O₂
• mdl: MFCD00080614
• 分子量: 366.13
• InChiKey: OZGWOALFBHODRB-UHFFFAOYSA-N

物化性质

• 沸点：
  50°C 5mm
• 密度：
  1,64 g/cm3
• 稳定性/保质期：

  常规情况下不会分解，没有危险反应。

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  13

安全信息

• 危险等级：
  IRRITANT
• 危险品标志：
  Xi
• 危险类别码：
  R36/37/38
• 海关编码：
  2916129000
• 安全说明：
  S26,S36/37/39

文献信息

• Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
  申请人：Central Glass Company, Limited

  公开号：US20130130175A1

  公开（公告）日：2013-05-23

  A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R 1 represents a monovalent organic group, and Q + represents a sulfonium cation or iodonium cation.

  以下是用作优良的辐射敏感性酸发生剂的磺酸醋銨盐的化学式（1）。通过使用含有与化学式（1）对应的磺酸醋銨盐的抗蚀组合物，可以形成良好的图案： 其中R1代表一价有机基团，Q+代表磺銨阳离子或碘銨阳离子。
• NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180044459A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.

  制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生（PAG）可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的硫也直接连接到氟化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射（如深紫外或极紫外光）时释放出强磺酸。在经过后曝光烘烤（PEB）处理（100°C至150°C）的暴露光刻胶层中，光生成的磺酸扩散速率较低，结果在显影后形成良好的线型图案。
• Functionalized Photoreactive Compounds
  申请人：Cherkaoui Mohammed Zoubair

  公开号：US20080274304A1

  公开（公告）日：2008-11-06

  The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.

  本发明涉及式(I)的官能化光反应化合物，特别适用于液晶对准材料。由于在特定分子系统中的不饱和键直接连接到两个不饱和环系统上附加了一个电子受体基团，因此在包含本发明的这些官能化光反应化合物的材料中可以实现异常高的光敏性、优异的对准性能以及良好的机械稳健性。
• Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120322006A1

  公开（公告）日：2012-12-20

  A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C 1 -C 3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M + represents a monovalent cation. This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.

  根据本发明，磺酸盐树脂具有以下通用公式（3）的重复单元：其中X分别表示氢原子或氟原子；n表示1至10的整数；R表示氢原子、卤原子或C1-C3烷基或含氟烷基团；J表示二价连接基团；M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐，磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上，因此作为具有良好抗性特性（如DOF、LER、灵敏度和分辨率）的抗性树脂。
• [EN] CYANOSTILBENES<br/>[FR] CYANOSTILBÈNES
  申请人：ROLIC AG

  公开号：WO2014191292A1

  公开（公告）日：2014-12-04

  The present invention relates to novel compounds that are particularly useful for the alignment, especially photoalignment, of slave material, especially liquid crystals for optical or electro-optical applications, such as security applications, liquid crystal devices or optical or electro-optical films.

  本发明涉及一种新型化合物，特别适用于用于光学或电光应用的从材料，尤其是液晶的定向，特别是光定向，如安全应用、液晶器件或光学或电光薄膜。