A process for preparing a polyhydric alcohol according to the invention comprises subjecting a polyhydric alcohol compound having protected hydroxy group(s) to microwave irradiation in the presence of basic compound(s) or acid(s) having an acid dissociation exponent (pKa) of −8 to 3 at 25° C. to remove the protecting groups of the hydroxy group of the polyhydric alcohol compound. The invention can provide an industrially advantageous process for preparing polyhydric alcohols by readily removing protecting group(s) from protected hydroxy group(s) of polyhydric alcohol compounds.
PROCESS FOR THE PREPARATION OF POLYHYDRIC ALCOHOLS
申请人:National Institute of Advanced Industrial Science and Technology
公开号:EP1298115A1
公开(公告)日:2003-04-02
A process for preparing a polyhydric alcohol according to the invention comprises subjecting a polyhydric alcohol compound having protected hydroxy group(s) to microwave irradiation in the presence of basic compound(s) or acid(s) having an acid dissociation exponent (pKa) of -8 to 3 at 25°C to remove the protecting groups of the hydroxy group of the polyhydric alcohol compound. The invention can provide an industrially advantageous process for preparing polyhydric alcohols by readily removing protecting group(s) from protected hydroxy group(s) of polyhydric alcohol compounds.
Merchant, J.R.; Upasani, R.B., Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 1984, vol. 23, # 5, p. 424 - 426
作者:Merchant, J.R.、Upasani, R.B.
DOI:——
日期:——
MERCHANT, J. R.;UPASAI, R. B., INDIAN J. CHEM., 1984, 23, N 5, 424-426
作者:MERCHANT, J. R.、UPASAI, R. B.
DOI:——
日期:——
NOVEL SULFONIUM SALT COMPOUND, METHOD FOR PRODUCING THE SAME, AND PHOTOACID GENERATOR
申请人:DSP GOKYO FOOD & CHEMICAL CO., LTD.
公开号:US20150293445A1
公开(公告)日:2015-10-15
Provided is a sulfonium salt compound represented by the following general formula (I):
where R
1
and R
2
each denote the same or a different alkyl group having 1 to 18 carbon atoms, R
3
and R
4
each denote the same or a different alkyl group having 1 to 10 carbon atoms, and X
−
denotes a sulfone imide anion or a perfluoroalkanesulfonic acid anion, wherein the substituents denoted by R
3
O and R
4
O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group.