1-(4-氨基丁基氨基)蒽-9,10-二酮,氮烷,铂(+2)阳离子,氯化,硝酸酯 | 71929-22-1

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 1-(4-氨基丁基氨基)蒽-9,10-二酮,氮烷,铂(+2)阳离子,氯化,硝酸酯
• 中文别名: 四丙基铵甲酸盐
• 英文名称: Tetrapropylammonium formate
• 英文别名: tetrapropylazanium;formate
• CAS: 71929-22-1
• 化学式: C13H29NO2
• 分子量: 231.37
• InChiKey: LENBOWGJEQXFCI-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.81
• 重原子数：
  16
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same
  申请人：Tokumoto Katsuml

  公开号：US20070112085A1

  公开（公告）日：2007-05-17

  An object of the present invention is to provide a catalyst for producing a rigid polyurethane foam and an isocyanurate-modified rigid polyurethane foam excellent in storage stability in the case that water is contained as a blowing agent, and a raw material-blended composition using the same. In the present invention, a catalyst composition comprising the following amine compounds of (A) and (B) and/or (C) is used and further, a raw material-blended composition further containing a polyol component and water is used. (A) A quaternary ammonium salt represented by the following general formula (1): wherein each of R 1 to R 3 represents a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents an alkyl group or an aromatic hydrocarbon group having 1 to 18 carbon atoms, and X represents an organic acid group having an acid dissociation constant (pKa) of 4.8 or less; (B) A hydrophobic amine compound; (C) A heterocyclic tertiary amine compound.

  本发明的目的是提供一种催化剂，用于生产含水为发泡剂的刚性聚氨酯泡沫和异氰酸酯改性的刚性聚氨酯泡沫，并具有良好的储存稳定性，以及使用相同的原料混合组合物。在本发明中，使用以下胺化合物（A）和（B）和/或（C）组成的催化剂组合物，并且还使用进一步包含聚醇组分和水的原料混合组合物。(A) 由以下通式（1）表示的季铵盐：其中，R1至R3分别表示具有1至12个碳原子的碳氢基团，R4表示具有1至18个碳原子的烷基基团或芳香族碳氢基团，X表示具有酸解离常数（pKa）小于4.8的有机酸基团；(B) 疏水胺化合物；(C) 杂环三级胺化合物。
• CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME
  申请人：TOKUMOTO Katsumi

  公开号：US20120035289A1

  公开（公告）日：2012-02-09

  An object of the present invention is to provide a catalyst for producing a rigid polyurethane foam and an isocyanurate-modified rigid polyurethane foam excellent in storage stability in the case that water is contained as a blowing agent, and a raw material-blended composition using the same. In the present invention, a catalyst composition comprising the following amine compounds of (A) and (B) and/or (C) is used and further, a raw material-blended composition further containing a polyol component and water is used. (A) A quaternary ammonium salt represented by the following general formula (1): wherein each of R 1 to R 3 represents a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents an alkyl group or an aromatic hydrocarbon group having 1 to 18 carbon atoms, and X represents an organic acid group having an acid dissociation constant (pKa) of 4.8 or less; (B) A hydrophobic amine compound; (C) A heterocyclic tertiary amine compound.

  本发明的目的是提供一种催化剂，用于生产在水作为发泡剂时具有良好储存稳定性的硬质聚氨酯泡沫和异氰酸酯改性的硬质聚氨酯泡沫，以及使用该催化剂的原料混合组合物。在本发明中，使用以下胺化合物（A）和（B）和/或（C）组成的催化剂组合物，并进一步使用含有聚醚组分和水的原料混合组合物。(A) 由下式（1）表示的季铵盐：其中R1至R3分别表示具有1至12个碳原子的碳氢基团，R4表示具有1至18个碳原子的烷基基团或芳香族碳氢基团，X表示具有酸解离常数（pKa）小于4.8的有机酸基团；(B) 疏水胺化合物；(C) 杂环三级胺化合物。
• CATALYST COMPOSITION FOR PRODUCTION OF POLYURETHANE RESIN AND METHOD FOR PRODUCING POLYURETHANE RESIN (AS AMENDED)
  申请人：Kometani Hiroyuki

  公开号：US20100130629A1

  公开（公告）日：2010-05-27

  Disclosed is a catalyst composition for polyurethane resin production which contains (A) triethylenediamine, (B) a specific polyisocyanurating catalyst and/or (C) a specific highly temperature-sensitive catalyst. By using this catalyst composition, a polyurethane resin can be molded with good curability, while suppressing initial reactivity. Consequently, a polyurethane resin having excellent moldability and fluidity can be produced with high productivity by using the catalyst composition. The thus-obtained polyurethane resin is suitably applicable to shoe soles. The component (B) is selected from the group consisting of alkali metal salts of carboxylic acids, quaternary ammonium compounds expressed as R 1 R 2 R 3 R 4 N + ,X − , N,N,N′-trimethylaminoethylethanolamine, and 2,4,6-tris(dimethylaminomethyl)phenol, while the component (C) is selected from the group consisting of triazole salts and benzotriazole salts of 1,8-diazabicyclo[5.4.0]undecene-7 or 1,5-diazabicyclo[4.3.0]nonene-5. The mixing ratio of the component (B) and/or the component (C) to the component (A) is from 2% by weight to 60% by weight.

  本发明涉及一种用于聚氨酯树脂生产的催化剂组合物，其包含（A）三乙二胺，（B）特定的聚异氰酸酯催化剂和/或（C）特定的高温敏感催化剂。通过使用这种催化剂组合物，可以制造具有良好可固化性的聚氨酯树脂，同时抑制初始反应性。因此，使用催化剂组合物可以生产具有出色的可塑性和流动性的聚氨酯树脂，并具有高生产率。因此制造的聚氨酯树脂适用于鞋底。组分（B）选自羧酸的碱金属盐、表示为R1R2R3R4N+，X−的季铵化合物、N，N，N′-三甲基氨基乙基乙醇胺和2,4,6-三（二甲胺甲基）苯酚组成的群，而组分（C）选自1,8-二氮杂双环[5.4.0]十一烯-7或1,5-二氮杂双环[4.3.0]壬烯-5的三唑盐和苯并三唑盐组成的群。组分（B）和/或组分（C）与组分（A）的混合比重为2重量％至60重量％。
• Cleaning agent for semiconductor device and method for manufacturing semiconductor device
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP0662705A2

  公开（公告）日：1995-07-12

  There are disclosed a method of manufacturing a semiconductor device by forming a mask with a photoresist on a conductive layer formed on a semiconductor substrate and then forming a wiring structure by dryetching which method comprises a cleaning step of peeling a protecting deposition film formed on side walls of the conductive layer and the photoresist by using a cleaning agent for a semiconductor device comprising an aqueous solution containing a specific quaternary ammonium salt and a fluoro-compound; and a cleaning agent for a semiconductor device which comprises a specific quaternary ammonium salt and a fluoro-compound, and optionally an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. The use of the above cleaning agent in the method of manufacturing a semiconductor device can peel out the protecting deposition film with extreme certainty, whereby the surface of the conductive layer is decontaminated to high cleanness and corrosion problem is eliminated.

  本发明公开了一种通过在半导体衬底上形成的导电层上用光致抗蚀剂形成掩膜，然后通过干蚀刻形成布线结构来制造半导体器件的方法，该方法包括一个清洁步骤，即使用一种半导体器件用清洁剂剥离在导电层和光致抗蚀剂侧壁上形成的保护沉积膜，该清洁剂包括一种含有特定季铵盐和氟化合物的水溶液；和一种用于半导体器件的清洗剂，该清洗剂包括一种特定的季铵盐和一种氟化合物，以及一种可选的有机溶剂，该有机溶剂选自由酰胺类、内酯类、腈类、醇类和酯类组成的组。在半导体设备的制造方法中使用上述清洁剂，可以非常准确地剥离保护沉积膜，从而使导电层表面得到高度清洁的净化，消除腐蚀问题。
• Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP0827188A2

  公开（公告）日：1998-03-04

  There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

  本发明公开了一种用于生产半导体器件的清洗液，其包括(A)含氟化合物；(B)水溶性或水混溶性有机溶剂；以及(C)无机酸和/或有机酸，可选地，还包括(D)季铵盐或(D')特定有机羧酸铵盐和/或有机羧酸胺盐；以及一种半导体器件的生产工艺，在表面装有绝缘膜层或金属导电层的基片上形成抗蚀图案，通过干法蚀刻形成通孔或电线，通过氧等离子体灰化处理去除抗蚀图案，并用上述清洗液进行清洗处理。上述清洗液和生产工艺可轻松去除干法蚀刻时形成的沉积聚合物，而不会损害金属膜和绝缘膜。